Palladium nanoparticles on silicon by photo-reduction using 172 nm excimer UV lamps

Q. Fang; G. He; W.P. Cai; J.-Y. Zhang; Ian W. Boyd

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Palladium nanoparticles on silicon by photo-reduction using 172 nm excimer UV lamps

机译：使用172 nm准分子紫外灯进行光还原，在硅上沉积钯纳米颗粒

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We report a photochemical procedure induced by ultraviolet (UV) radiation for the preparation of palladium (Pd) nanoparticles on silicon surface at room temperature. Palladium acetate (Pdac, Pd(OCOCH_3)_2) was used as the precursorwhich was sprayed-on to the Si and irradiated by UV light at a wavelength of 172 nm. Scanning electron microscope (SEM), AFM, XRD, and UV-Vis spectroscopy have been used to characterize the as-prepared nanoparticles. The mechanism of growth of Pd particles and the photo-reduction induced by UV radiation are discussed. The effects of precursor concentration, UV-irradiation time, and annealing conditions on the size and distribution of the palladium nanoparticles on Si are also reported.

机译：我们报告了由紫外线（UV）辐射在室温下在硅表面上制备钯（Pd）纳米粒子的光化学过程。使用乙酸钯（Pdac，Pd（OCOCH_3）_2）作为前体，将其喷涂到Si上并用波长为172nm的UV光照射。扫描电子显微镜（SEM），AFM，XRD和UV-Vis光谱已用于表征制备的纳米颗粒。讨论了Pd颗粒的生长机理和紫外线辐射引起的光还原。还报道了前驱体浓度，紫外线照射时间和退火条件对钯纳米粒子在硅上的尺寸和分布的影响。

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来源
《Applied Surface Science》 |2004年第3期|p.7-11|共5页
作者
Q. Fang; G. He; W.P. Cai; J.-Y. Zhang; Ian W. Boyd;
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作者单位

Key Laboratory of Materials Physics, Institute of Solid State Physics, Chinese Academy of Sciences, Hefei 230031, PR China;

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原文格式 PDF
正文语种 eng
中图分类应用物理学;
关键词
pd nanoparticles; UV-irradiation; photo-reduction; UV excimer lamps;

机译：钯纳米粒子;紫外线照射;光还原;紫外线准分子灯;

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Palladium nanoparticles on silicon by photo-reduction using 172 nm excimer UV lamps

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