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首页> 外文期刊>Applied Surface Science >Excimer laser ablation lithography applied to the fabrication of reflective diffractive optics
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Excimer laser ablation lithography applied to the fabrication of reflective diffractive optics

机译：准分子激光烧蚀光刻技术在反射衍射光学器件的制造中的应用

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摘要

We propose a low cost technique for the production of diffractive optical elements (DOE). These elements are devoted to high power lasers beam shaping in the mid-infrared wavelengths. This process called laser ablation lithography (LAL), may seem similar to laser beam writing (LBW) in the way the whole DOE's design is reproduced pixel by pixel on the substrate placed on a computer controlled XY translation stage. A first difference is that the photoresist is not exposed with UV light but is directly ablated with short excimer laser pulses. Furthermore, with LAL technique the size of the smallest pixel (5μm x 5μm) is more than 10 times greater than those produced by LBW. We discuss in details the experimental set-up for LAL and demonstrate that it gives a resolution up to 10 times greater than photolithography with flexible masks. This makes LAL a promising solution for the production of DOE for use with Nd:YAG lasers. New applications of DOEs are finally introduced with high power lasers sources, such as laser marking or multi-point brazing.
机译：我们提出了一种用于生产衍射光学元件（DOE）的低成本技术。这些元件专门用于中红外波长的高功率激光束整形。这种称为激光烧蚀光刻（LAL）的过程可能看起来与激光束写入（LBW）类似，因为整个DOE的设计都是通过在计算机控制的XY平移台上的基板上逐像素地再现的。第一个区别是光致抗蚀剂没有被紫外线照射，而是被短的准分子激光脉冲直接烧蚀。此外，使用LAL技术时，最小像素（5μmx5μm）的大小是LBW的10倍以上。我们将详细讨论LAL的实验设置，并证明其分辨率比使用柔性掩模的光刻技术高出10倍。这使得LAL成为用于Nd：YAG激光器的DOE生产的有前途的解决方案。最终，DOE的新应用被引入了高功率激光源，例如激光打标或多点钎焊。

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