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首页> 外文期刊>Applied Surface Science >Investigation of interface roughness and roughness correlation in solid-state multilayer by coplanar diffuse X-ray scattering
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Investigation of interface roughness and roughness correlation in solid-state multilayer by coplanar diffuse X-ray scattering

机译：通过共面漫射X射线散射研究固态多层膜的界面粗糙度和粗糙度相关性

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The interface roughness and the correlation of the interface roughness in solid-state multilayer systems is of major interest due to the characterisation of the performance of such systems with respect to transport processes, both electrical and optical. The measurement of these parameters and their replication through thin solid films provides a way to investigate the physical processes during the growth process also (e.g. MBE, MOVPE). The diffuse X-ray scattering in coplanar geometry is well suited to measure these parameters without destruction of the sample. Two-dimensional X-ray scattering patterns in reciprocal space (space map) are measured by reflection in the region of total reflection. The analysis of the diffuse part of the reflected radiation by simulation programs gives access to the essential information about the statistical parameters of the interfaces. Due to the large area illuminated during the measurement, the extracted parameters have a high statistical significance. The talk presents results obtained with a high-power rotating anode at PTB. The measurements were carried out on different multilayer structures prepared by MOVPE, MBE and sputtering. The results will be compared with simulation and AFM based data of the internal interface.
机译：固态多层系统中的界面粗糙度和界面粗糙度的相关性是主要关注的问题，这是由于这种系统相对于电和光传输过程的性能表征。这些参数的测量以及它们通过薄膜的复制提供了一种方法来研究生长过程中的物理过程（例如MBE，MOVPE）。共面几何中的漫射X射线散射非常适合在不破坏样品的情况下测量这些参数。通过在全反射区域中的反射来测量互易空间（空间图）中的二维X射线散射图。通过仿真程序对反射辐射的散射部分进行分析，可以访问有关界面统​​计参数的基本信息。由于在测量过程中照明的面积很大，因此提取的参数具有很高的统计意义。演讲介绍了使用PTB的大功率旋转阳极获得的结果。在通过MOVPE，MBE和溅射制备的不同多层结构上进行测量。将结果与内部接口的基于仿真和AFM的数据进行比较。

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