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Effects of post-deposition annealing on the mechanical and chemical properties of the Si3N4/NbN multilayer coatings

机译:沉积后退火对Si3N4 / NbN多层涂层机械和化学性能的影响

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Multilayered thin films consisting of alternate layers of silicon nitride (Si3N4) and niobium nitride (NbN) have been prepared by a dc reactive sputtering technique in nitrogen and argon atmosphere using high purity Nb and Si targets for various flow ratios of N-2/Ar. It has been found that the hardness of the multilayered system is higher than that of the constituent individual layers of equal thickness. Although a single layer of amorphous Si3N4 has higher hardness compared with a single layer of nanocrystalline NbN at all the deposition conditions used in this experiment, the hardness of the multilayer coatings consisting of consecutive Si3N4/NbN layers strongly follows the hardness variation of the polycrystalline NbN. When the multilayer coatings are subjected to post-deposition annealing at high temperatures, it has been found that both the hardness and the adhesion strength of the coating decrease with increasing annealing temperature. X-ray photoelectron spectroscopy (XPS) results reveal that oxidation of the coatings during annealing plays a crucial role behind such deterioration in mechanical properties. Further, it has been noted that NbN is a more oxidation resistant material than Si3N4. Therefore, it has been proposed that during preparation of multilayers with consecutive thin layers of NbN and Si3N4, the topmost layer should be made of NbN, instead Of Si3N4, to prevent the oxygen diffusion from the top surface layer to the next layer underneath. (C) 2003 Elsevier Science B.V. All rights reserved. [References: 25]
机译:通过直流反应溅射技术,在氮气和氩气气氛中使用高纯度的Nb和Si靶材,针对不同的N-2 / Ar流量比,通过dc反应溅射技术制备了由氮化硅(Si3N4)和氮化铌(NbN)的交替层组成的多层薄膜。 。已经发现,多层体系的硬度高于相等厚度的组成的各个层的硬度。尽管在此实验中使用的所有沉积条件下,单层非晶Si3N4的硬度均比纳米晶NbN的单层高,但由连续的Si3N4 / NbN层组成的多层涂层的硬度强烈遵循多晶NbN的硬度变化。已经发现,当多层涂层在高温下进行沉积后退火时,发现涂层的硬度和粘附强度都随着退火温度的升高而降低。 X射线光电子能谱(XPS)结果表明,退火过程中涂层的氧化在这种机械性能下降中起着至关重要的作用。此外,已经注意到,NbN比Si 3 N 4是更抗氧化的材料。因此,已经提出在制备具有连续的NbN和Si 3 N 4的薄层的多层期间,最上层应该由Nb N代替Si 3 N 4制成,以防止氧从上表面层扩散到下面的下一层。 (C)2003 Elsevier Science B.V.保留所有权利。 [参考:25]

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