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Europium monoxide nanocrystalline thin films with high near-infrared transparency

机译:具有高近红外透明度的一氧化oxide纳米晶体薄膜

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摘要

Nanocrystalline textured EuO thin films are prepared by an oxygen loss process from a pure Eu2O3 bulk ceramic target through pulsed laser deposition in vacuum at room temperature. X-ray diffraction spectra evidence a well-defined diffraction peak corresponding to the EuO phase textured along the (1 1 0) direction. Analysis of the XRD peak profile indicates that the films are nanocrystalline (average crystallite size of 11 nm) with a compressive residual strain. The formation of stoichiometric EuO is further confirmed by a strong signal from Eu2+ in the Xray photoelectron spectra. The complex refractive index in the near infrared has been determined by spectroscopic ellipsometry and shows that the EuO films have a high transparency (k 10(-3)) and a refractive index of 2.1. A band-gap shift of 0.25 eV is found with respect to the EuO bulk. These films, deposited by an accessible and efficient method, open a new route to produce EuO films with optical quality, suitable for NIR optoelectronic components.
机译:纳米晶织构的EuO薄膜是通过氧气损失过程从纯Eu2O3块状陶瓷靶材通过室温真空下的脉冲激光沉积制备的。 X射线衍射光谱显示出一个明确定义的衍射峰,该峰对应于沿(1 1 0)方向织构的EuO相。 XRD峰轮廓的分析表明,该膜是具有压缩残余应变的纳米晶体(平均微晶尺寸为11nm)。 X射线光电子光谱中来自Eu2 +的强信号进一步证实了化学计量EuO的形成。近红外光谱的复折射率已经通过椭圆偏振光谱法测定,表明EuO薄膜具有很高的透明度(k <10(-3))和2.1的折射率。发现相对于EuO体积,带隙位移为0.25eV。这些薄膜通过一种便捷有效的方法沉积,开辟了一条新路线,以生产适用于NIR光电组件的具有光学质量的EuO薄膜。

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