Intrinsic stresses in Ti_(1-x)Al_xN coatings deposited by vacuum arc method

Kalinichenko Alexander; Perepelkin Sergej; Strelnitskij Volodymyr

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Intrinsic stresses in Ti_(1-x)Al_xN coatings deposited by vacuum arc method

机译：真空电弧法沉积Ti_（1-x）Al_xN涂层的本征应力

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The model of the nonlocal thermoelastic peak of low-energy ion is used in deriving an expression for intrinsic stress in multi-component material deposited from mixed beam of differently charged ions in modes of the direct current (DC) and pulsed bias potential. Calculation of intrinsic stress depending on bias potential in coating Ti1-xAlxN deposited from mixed ion beam Ti + Al with different component ratio is executed in modes of DC and pulsed bias potential at different substrate temperatures. It is shown that the increase of the content x of Al ions in the mixed beam and in deposited Ti1-xAlxN coating reduces the maximum of the stress curve sigma(U).

机译：低能离子的非局部热弹性峰模型用于推导由直流电和脉冲偏置电势模式下的带不同电荷的离子的混合束沉积而成的多组分材料的固有应力表达式。根据直流电和脉冲偏置电势在不同基板温度下，根据由混合离子束Ti + Al混合离子束Ti + Al沉积的Ti1-xAlxN涂层中的偏置电势来计算固有应力。结果表明，混合束和沉积的Ti1-xAlxN涂层中Al离子含量x的增加会减小应力曲线sigma（U）的最大值。

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来源
《Applied Surface Science》 |2019年第31期|2-6|共5页
作者
Kalinichenko Alexander; Perepelkin Sergej; Strelnitskij Volodymyr;
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作者单位

Natl Sci Ctr, Kharkov Inst Phys & Technol, 1 Akad Skaya Str, UA-61108 Kharkov, Ukraine;

Natl Sci Ctr, Kharkov Inst Phys & Technol, 1 Akad Skaya Str, UA-61108 Kharkov, Ukraine;

Natl Sci Ctr, Kharkov Inst Phys & Technol, 1 Akad Skaya Str, UA-61108 Kharkov, Ukraine;

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正文语种 eng
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关键词
Plasma immersion ion implantation; Pulsed bias potential; Nitride multicomponent coating deposition; Thermal peak of ion; Intrinsic stress; Mathematic model;

机译：等离子体浸没离子注入;脉冲偏压;氮化物多组分涂层沉积;离子热峰;固有应力;数学模型;

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专利

1. Effect of the aluminium content and the bias voltage on the microstructure formation in Ti_(1-x)Al_xN protective coatings grown by cathodic arc evaporation [J] . Wüstefeld C., Rafaja D., Klemm V., Surface & Coatings Technology . 2010,第5期

机译：铝含量和偏压对阴极电弧蒸发生长Ti_（1-x）Al_xN保护层组织形成的影响
2. Mechanical, tribological, and electrochemical behavior of Cr_(1-x)Al_xN coatings deposited by r.f. reactive magnetron co-sputtering method [J] . J.E. Sanchez, O.M. Sanchez, L. Ipaz, Applied Surface Science . 2010,第8期

机译：r.f.沉积的Cr_（1-x）Al_xN涂层的力学，摩擦学和电化学行为反应磁控共溅射方法
3. Cr_(1-x)Al_xN coatings deposited by lateral rotating cathode arc for high speed machining applications [J] . Xing-zhao Ding, X.T. Zeng, Y.C. Liu, Thin Solid Films . 2008,第8期

机译：横向旋转阴极电弧沉积的Cr_（1-x）Al_xN涂层，用于高速加工应用
4. Gradient ZrAlNbN-Coatings Deposited by Vacuum-Arc Plasma-Assisted Method [C] . Olga Krysina, Nikita Prokopenko, Vladimir Shugurov, International Congress on Energy Fluxes and Radiation Effects . 2020

机译：真空电弧等离子体辅助沉积的ZrAlNbN梯度涂层
5. ADHESION, RESIDUAL STRESSES AND TRIBOLOGY OF RF SPUTTER DEPOSITED TITANIUM CARBIDE COATINGS. [D] . PAN, ALFRED I-TSUNG. 1981

机译：射频溅射沉积碳化钛涂层的附着力，残余应力和摩擦学。
6. Characterization of Platinum-Based Thin Films Deposited by Thermionic Vacuum Arc (TVA) Method [O] . Sebastian Cozma, Rodica Vlǎdoiu, Aurelia Mandes, 2020

机译：热真空电弧法（TVA）沉积的铂基薄膜的表征
7. The effect of unintentional oxygen incorporation into Cr-CrN-DLC coatings deposited by MePIIID method using filtered cathodic vacuum arc carbon and metal plasma [O] . Walkowicz J., Bujak J., Zavaleyev V. 2010

机译：使用过滤的阴极真空电弧碳和金属等离子体通过MePIIID方法在Cr-CrN-DLC涂层中意外掺入氧气的影响

Intrinsic stresses in Ti_(1-x)Al_xN coatings deposited by vacuum arc method

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