COMPARISON BETWEEN THE PITTING CORROSION OF PURE Al AND Al-Si ALLOYS IN DEAERATED NEUTRAL SODIUM PERCHLORATE SOLUTIONS AND THE EFFECT OF SOME INORGANIC INHIBITORS

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COMPARISON BETWEEN THE PITTING CORROSION OF PURE Al AND Al-Si ALLOYS IN DEAERATED NEUTRAL SODIUM PERCHLORATE SOLUTIONS AND THE EFFECT OF SOME INORGANIC INHIBITORS

机译：脱铝中性高氯酸钠溶液中纯Al和Al-Si合金点蚀的比较以及某些无机抑制剂的影响

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The many important applications of Al and Al alloys have resulted in research into their electrochemical behavior and corrosion inhibition in a wide variety of media. The breakdown of the passive oxide films on Al and its alloys, by aggressive anions such as halides at sufficiently positive anodic potentials is frequently responsible for the failure of Al and its alloys in aqueous halide solutions, because it usually leads to severe pitting of the underlying metal [1-12]. Literature survey showed that little seems to have been published concerning pitting corrosion of Al and its alloys in perchlorate solutions.

机译：铝和铝合金的许多重要应用已导致人们在各种介质中研究其电化学行为和缓蚀性能。 Al和它的合金上的钝化氧化物膜被侵蚀性阴离子（如卤化物）以足够正的阳极电势击穿，通常是导致Al和它的合金在卤化物水溶液中失效的原因，因为这通常会导致其下层的严重点蚀金属[1-12]。文献调查表明，关于Al及其合金在高氯酸盐溶液中的点蚀的报道似乎很少。

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《Arabian Journal for Science and Engineering》 |2008年第2a期|187-197|共11页
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收录信息美国《科学引文索引》(SCI);
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COMPARISON BETWEEN THE PITTING CORROSION OF PURE Al AND Al-Si ALLOYS IN DEAERATED NEUTRAL SODIUM PERCHLORATE SOLUTIONS AND THE EFFECT OF SOME INORGANIC INHIBITORS

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