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Surface Modification of the Ti6Al4V Alloy with Silicon Carbonitride Layer Deposited by PACVD Method

机译:PACVD法沉积碳氮化硅层对Ti6Al4V合金的表面改性

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摘要

Four different layers of various silicon, carbon and nitrogen contents on the Ti6Al4V alloy and (001)Si wafers have been deposited by means of Plasma Assisted Chemical Vapor Deposition (PACVD) method. The layers were obtained from reactive gas mixture containing SiH_4, CH_4, NH_3 and Ar. After deposition the structure and chemical composition of modified surfaces have been analyzed with use of SEM/EDS technique. Based on these results and thermodynamic calculations, the diffusion coefficients, D, for nitrogen and carbon in alloy were discussed. Scratch test shown that silicon carbonitride layers have good adhesion to metal surface. In order to determine atomic structure of obtained layers, FTIR spectra for layer-(001)Si and Iayer-Ti6Al4V were registered.
机译:已通过等离子辅助化学气相沉积(PACVD)方法在Ti6Al4V合金和(001)Si晶片上沉积了四层不同的硅,碳和氮。这些层是从含有SiH_4,CH_4,NH_3和Ar的反应气体混合物中获得的。沉积后,已使用SEM / EDS技术分析了改性表面的结构和化学成分。根据这些结果和热力学计算,讨论了氮和碳在合金中的扩散系数D。划痕试验表明碳氮化硅层对金属表面具有良好的粘附性。为了确定获得的层的原子结构,记录了层-(001)Si和Iayer-Ti6Al4V的FTIR光谱。

著录项

  • 来源
    《High temperature materials and processes》 |2014年第5期|391-398|共8页
  • 作者单位

    Faculty of Materials Science and Ceramics, AGH University of Science and Technology, Krakow 30-059, Poland;

    Faculty of Materials Science and Ceramics, AGH University of Science and Technology, Krakow 30-059, Poland;

    Faculty of Materials Science and Ceramics, AGH University of Science and Technology, Krakow 30-059, Poland;

    Faculty of Materials Science and Ceramics, AGH University of Science and Technology, Krakow 30-059, Poland;

    Faculty of Materials Science and Ceramics, AGH University of Science and Technology, Krakow 30-059, Poland;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);美国《化学文摘》(CA);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    SiC_xN_y(H) layers; PACVD method; Ti6Al4V; scratch test;

    机译:SiC_xN_y(H)层;PACVD法;Ti6Al4V;划痕测试;

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