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Production of Silicon-based Nano-scale Materials Through High Temperature Reduction of Silica by Titanium

机译:钛高温还原二氧化硅制备硅基纳米材料

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摘要

The reduction of silica by titanium at 2073 K has been studied in order to develop a production process of silicon-based nano-scale materials. The silicon monoxide vapour, reaction intermediate products, has been transferred by argon carrier gas to colder parts of the reactor, which results in the disproportionation reaction to form Si and SiO_2- The products include particles with diameter of 10-100 nm order and wires. An attempt to remove SiO_2 by hydrofluoric acid treatment of the reduction products resulted in the enrichment of Si particles.
机译:为了发展硅基纳米级材料的生产工艺,已经研究了钛在2073 K下对二氧化硅的还原。一氧化硅蒸气(反应中间产物)已通过氩气载气转移到反应器的较冷部分,这导致歧化反应形成Si和SiO_2。产物包括直径为10-100 nm的颗粒和金属丝。尝试通过氢氟酸处理还原产物去除SiO_2导致了Si颗粒的富集。

著录项

  • 来源
    《High temperature materials and processes》 |2011年第5期|p.367-372|共6页
  • 作者单位

    Department of Materials Science and Engineering, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, 464-8603 Nagoya, Japan;

    Department of Materials Science and Engineering, Grad- uate School of Engineering, Nagoya University, Nagoya, Japan;

    Department of Materials Science and Engineering, Grad- uate School of Engineering, Nagoya University, Nagoya, Japan;

    Department of Materials Science and Engineering, Grad- uate School of Engineering, Nagoya University, Nagoya, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);美国《化学文摘》(CA);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    silicon; nano-materials; high temperature reduction; silica; titanium;

    机译:硅;纳米材料高温还原二氧化硅钛;

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