Investigation on high magnetoresistance Ni_(0.81)Fe_(0.19) films grown on (Ni_(0.81)Fe_(0.19))_(1-x)Cr_x underlayers

LI Haifeng; MA Jidong; YU Guanghua; LONG Shibin; ZHAO Hongchen; ZHU Fengwu

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Investigation on high magnetoresistance Ni_(0.81)Fe_(0.19) films grown on (Ni_(0.81)Fe_(0.19))_(1-x)Cr_x underlayers

机译：在（Ni_（0.81）Fe_（0.19））_（1-x）Cr_x底层上生长的高磁阻Ni_（0.81）Fe_（0.19）膜的研究

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We have fabricated Ni_(0.81)Fe_(0.19) films with (Ni_(0.81)Fe_(0.19))_(1-x)Cr_x films as underlayers by dc magnetron sputtering, the results show that larger anisotropic magnetoresistance (ΔR/R) values of Ni_(0.81)Fe_(0.19) films are observed using the underlayers with Cr concentration of ～ 36 at.% at an optimum underlayer thickness of ～ 4.4 nm, the maximum AMR value is 3.35%. The results of atomic force microscope (AFM) and X-ray diffraction (XRD) show that the ΔR/R enhancement is attributed to the formation of large average grain size and the strong(111) texture in the Ni_(0.81)Fe_(0.19) films.

机译：通过直流磁控溅射制备了以（Ni_（0.81）Fe_（0.19））_（1-x）Cr_x膜为下层的Ni_（0.81）Fe_（0.19）膜，结果表明较大的各向异性磁阻（ΔR/ R）在最佳底层厚度为〜4.4 nm的条件下，使用Cr浓度为〜36 at。％的底层观察到Ni_（0.81）Fe_（0.19）薄膜的热阻值，最大AMR值为3.35％。原子力显微镜（AFM）和X射线衍射（XRD）的结果表明，ΔR/ R的增强归因于Ni_（0.81）Fe_（0.19）的平均晶粒尺寸大和织构强（111）。）电影。

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来源
《Chinese science bulletin》 |2003年第11期|p.1087-1089|共3页
作者
LI Haifeng; MA Jidong; YU Guanghua; LONG Shibin; ZHAO Hongchen; ZHU Fengwu;
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作者单位

Department of Material Physics and Chemistry, University of Science and Technology Beijing, Beijing 100083, China;

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正文语种 eng
中图分类自然科学现状及发展;
关键词
(Ni_(0.81)Fe_(0.19))_(1-x)Cr_x underlayer; anisotropic magnetoresis-tace; grain size; Ni_(0.81)Fe_(0.19)(111) texture;

机译：（Ni_（0.81）Fe_（0.19））_（1-x）Cr_x底层;各向异性磁感应强度;粒度;Ni_（0.81）Fe_（0.19）（111）织构;

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Investigation on high magnetoresistance Ni_(0.81)Fe_(0.19) films grown on (Ni_(0.81)Fe_(0.19))_(1-x)Cr_x underlayers

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