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Fine Lines in High Yield (Part CXXXIII): Safe Lighting in Yellow Room Exposure Areas

机译:细线高产(CXXXIII部分):黄色房间暴露区域的安全照明

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The subject of Safe Lighting has been previously covered in Tech Talk (No. 71, August, 2001). This column includes some updates, mostly concerning sourcing. The PWB industry standard photolithographic process uses negative working photoresists exposed with UV radiation in the near UV range, whereby the photoresist UV-radiation sensitivity is peaking around 365nm. More correctly, the photoresist is not only sensitive to UV radiation but also to near-UV visible light in the 410 to 430nm range which makes up the violet and blue light of the visible spectrum. This visible light is not "safe," i.e. it can lead to premature polymerization of the photoresist after the dry film has been removed from the box, and the black polyethylene cover has been removed from the film role. The unexposed resist needs to be protected from radiation to which it is sensitive to during lamination, before and after exposure, up to and through development.
机译:安全照明的主题以前已在技术讲座(2001年8月,第71号)中进行了介绍。本专栏包含一些更新,主要涉及采购。 PWB工业标准的光刻工艺使用负性工作光刻胶,该光刻胶在接近UV范围的UV辐​​射下曝光,因此光刻胶的UV辐射灵敏度在365nm左右达到峰值。更正确地说,光致抗蚀剂不仅对紫外线辐射敏感,而且对410至430nm范围内的近紫外线可见光敏感,后者构成了可见光谱的紫色和蓝色光。这种可见光不是“安全的”,即在将干膜从包装箱中取出并且将黑色聚乙烯覆盖物从膜中去除后,它会导致光致抗蚀剂过早聚合。需要保护未曝光的抗蚀剂,使其免受层压期间,曝光前后,直至显影直至显影的敏感影响。

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