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首页> 外文期刊>Corrosion science >High temperature oxidation behavior of Co-20Re-25Cr-2Si alloy at different oxygen pressures
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High temperature oxidation behavior of Co-20Re-25Cr-2Si alloy at different oxygen pressures

机译：不同氧气压力下CO-20R-25CR-2SI合金的高温氧化行为

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摘要

The oxidation of the quaternary Co-20Re-25Cr-2Si alloy has been studied at 1000 -1300 degrees C for 24 h. On the whole, at high oxygen pressure of 0.1 MPa the alloy shows mass loss while at low oxygen pressure of 3.0 x 10(-5) Pa, however, the alloy shows mass gain. Compared with the irregular kinetics under the oxygen pressure of 0.1 MPa, the kinetics approximately conform to parabolic law under the oxygen pressure of 3.0 x 10(-5) Pa, with the value of oxidation activation energy equal to 262.7 kJ/mol. The scales formed under the oxygen pressure of 0.1 MPa at 1000- 1300 degrees C are very similar. The outermost layer is CoO, followed by a mixed oxide layer probably composed of CoO and CoCr2O4. The innermost layer is probably composed mainly of a thin discontinuous layer of Cr2O3, accounting for the continuous mass loss due to the evaporation of Re element in the form of ReO3. However, the sales formed under the oxygen pressure of 3.0 x 10(-5) Pa are probably composed of an outer thin layer of CoCr2O4 spinel and an inner dense and continuous layer of Cr2O3, which provides the good oxidation resistance for the alloy. The combination of the addition of Si and low oxygen pressure has shown a synergistic effect on the formation of a protective chromia layer.
机译：已经在1000 -1300℃下进行季核苷酸氧化氧化24小时。在整体上，在0.1MPa的高氧气压力下，合金显示出质量损失，而在3.0×10（-5）Pa的低氧气压力下，该合金显示出质量增益。与0.1MPa氧气压力下的不规则动力学相比，动力学在3.0×10（ - 5）PA的氧气压力下大致符合抛物线规律，具有等于262.7kJ / mol的氧化活化能值。在1000-1300℃下在0.1MPa的氧气压力下形成的刻度非常相似。最外层是COO，然后是可能由COO和COCR2O4组成的混合氧化物层。最内层可能主要由CR2O3的薄不连续层组成，由于REO3形式的RE元素蒸发而占连续质量损失。然而，在3.0×10（ - 5）PA的氧气压力下形成的销售可能由CocR2O4尖晶石的外薄层和CR2O3的内密集和连续层组成，这为合金提供了良好的抗氧化性。添加Si和低氧气压的组合已经对保护染色层的形成具有协同作用。

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  • 来源
    《Corrosion science》 |2020年第5期|108562.1-108562.9|共9页
  • 作者

    Xu Xunhu; Xiang Junhuai; Wei Hua; Wang Ling; Zhang Honghua; Xiao Botao; Wang Ziyao; Zheng Xiaodong;

  • 作者单位

    Jiangxi Sci & Technol Normal Univ Jiangxi Key Lab Surface Engn Nanchang 330013 Jiangxi Peoples R China;

    Jiangxi Sci & Technol Normal Univ Jiangxi Key Lab Surface Engn Nanchang 330013 Jiangxi Peoples R China;

    Zhejiang Univ Ctr Hypergrav Expt & Interdisciplinary Res Hangzhou 310058 Peoples R China;

    Jiangxi Sci & Technol Normal Univ Jiangxi Key Lab Surface Engn Nanchang 330013 Jiangxi Peoples R China;

    Jiangxi Sci & Technol Normal Univ Jiangxi Key Lab Surface Engn Nanchang 330013 Jiangxi Peoples R China;

    Jiangxi Sci & Technol Normal Univ Jiangxi Key Lab Surface Engn Nanchang 330013 Jiangxi Peoples R China;

    Jiangxi Sci & Technol Normal Univ Jiangxi Key Lab Surface Engn Nanchang 330013 Jiangxi Peoples R China;

    Jiangxi Sci & Technol Normal Univ Jiangxi Key Lab Surface Engn Nanchang 330013 Jiangxi Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Quaternary alloy; High temperature oxidation; High and low oxygen pressure; Internal oxidation of Si;

    机译：季合金;高温氧化;高氧气压力;内部氧化SI;

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