Selective dissolution of the y phase in a binary Ni(γ)/Ni_3Al(γ') two-phase alloy

Hye-Youn Lee; Masahiko Demura; Ya Xu; Dang-Moon Wee; Toshiyuki Hirano

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Selective dissolution of the y phase in a binary Ni(γ)/Ni_3Al(γ') two-phase alloy

机译：y相在二元Ni（γ）/ Ni_3Al（γ'）两相合金中的选择性溶解

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Selective dissolution of Ni(γ) in a binary Ni(γ)/Ni_3Al(γ') two-phase alloy was performed in an aqueous electrolyte including 1 wt.% (NH_4)_2SO_4 and 1 wt.% citric acid to obtain a rough, γ'-terminated surface. The electrochemical potential for the selective dissolution was determined from the polarization curves of the γ and γ' single-phase alloys. The selective dissolution tests proved that y was precisely removed above 1.7 V_(SCE). resulting in the formation of a rough, γ'-terminated surface. Surface analyses revealed that a passive AlO_x, which retarded the dissolution, was preferentially formed on γ', resulting in a successful selective dissolution.

机译：在包含1 wt。％（NH_4）_2SO_4和1 wt。％柠檬酸的水性电解质中，将Ni（γ）选择性溶解在二元Ni（γ）/ Ni_3Al（γ'）两相合金中，γ'终止的表面。由γ和γ′单相合金的极化曲线确定了选择性溶解的电化学势。选择性溶出试验证明，在1.7 V_（SCE）以上，y被精确去除。导致形成粗糙的γ'端接表面。表面分析表明，阻碍溶解的被动AlO_x优先在γ'上形成，从而成功地实现了选择性溶解。

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来源
《Corrosion science》 |2010年第11期|p.3820-3825|共6页
作者
Hye-Youn Lee; Masahiko Demura; Ya Xu; Dang-Moon Wee; Toshiyuki Hirano;
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作者单位

Department of Materials Science and Engineering, KAIST, Daejeon 305-701, Republic of Korea National Institute for Materials Science, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan;

rnNational Institute for Materials Science, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan;

rnNational Institute for Materials Science, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan;

rnDepartment of Materials Science and Engineering, KAIST, Daejeon 305-701, Republic of Korea;

National Institute for Materials Science, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan;

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正文语种 eng
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关键词
A Nickel; A. Aluminium; B. Potentiostatic; C. Selective oxidation;

机译：镍;A.铝B.恒电位;C.选择性氧化;

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Selective dissolution of the y phase in a binary Ni(γ)/Ni_3Al(γ') two-phase alloy

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