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首页> 外文期刊>Brazilian Journal of Oral Sciences >Photoelastic and finite element stress analysis reliability for implant-supported system stress investigation
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Photoelastic and finite element stress analysis reliability for implant-supported system stress investigation

机译：光弹性和有限元应力分析在植入物支撑系统应力研究中的可靠性

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Aim: To compare the reliability between photoelastic and finiteelement (FE) analyses by evaluating the effect of differentmarginal misfit levels on the stresses generated on two differentimplant-supported systems using conventional and short implants. Methods: Two photoelastic models were obtained: model C with two conventional implants (4.1×11 mm); and model S with a conventional and a short implant (5×6 mm). Three-unitCoCr frameworks were fabricated simulating a superior first pre-molar (P) to first molar (M) fixed dental prosthesis. Different levels of misfit (μm) were selected based on the misfit averageof 10 frameworks obtained by the single-screw test protocol: low (20), medium (20 and 40) and high (40). Stress levels and distribution were measured by photoelastic analysis. A similar situation of the in vitro assay was designed and simulated by thein silico analysis. Maximum and minimum principal strain wererecorded numerically and color-coded for the models. Von Mises Stress was obtained for the metallic components. Results:Photoelasticity and FE analyses showed similar tendency wherethe increase of misfit generates higher stress levels despite ofthe implant design. The short implant showed lower von Mises stress values; however, it presented stresses around its full length for the in vitro and in silico analysis. Also, model S showedhigher μstrain values for all simulated misfit levels. The type ofimplant did not affect the stresses around pillar P. Conclusions:Photoelasticity and FEA are reliable methodologies presenting similarity for the investigation of the biomechanical behavior of implant-supported rehabilitations.
机译：目的：通过评估不同的边缘失配水平对使用传统植入物和短植入物的两个不同植入物支撑系统产生的应力的影响，比较光弹性分析和有限元分析（FE）之间的可靠性。方法：获得两个光弹性模型：具有两个常规植入物（4.1×11 mm）的模型C;具有两个模型的模型。模型S为传统植入物和短植入物（5×6 mm）。制作了三个单元的CoCr框架，模拟了比第一臼齿（M）固定的第一臼齿（M）优越的假牙。根据通过单螺杆测试方案获得的10个框架的失配平均值选择不同水平的失配（μm）：低（<20），中（> 20和<40）和高（> 40）。通过光弹性分析测量应力水平和分布。通过计算机模拟分析设计并模拟了类似的体外测定情况。用数字记录最大和最小主应变，并对模型进行颜色编码。对金属部件获得了冯·米塞斯应力。结果：尽管植入物设计不同，但光弹性和有限元分析显示出相似的趋势，其中失配的增加会产生更高的应力水平。短种植体显示较低的冯米塞斯应力值;但是，在体外和计算机分析中，应力表现出了全长的应力。同样，对于所有模拟失配水平，模型S均显示出较高的μstrain值。结论：光弹性和有限元分析是可靠的方法，在研究植入物支持的修复体的生物力学行为方面具有相似性。

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