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Study on Direct Current Electro-Deposition of Copper Nanowires in Anodic Alumina Membrane Pores

机译：阳极氧化铝膜孔中铜纳米线的直流电沉积研究

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摘要

Aluminum alloy plays an important role in industrial applications, but has a high friction coefficient and a high wear rate. On the basis of anodic oxidation treatment on an aluminum alloy surface, copper nanowires are deposited into the anodic alumina membrane pores by direct current (DC) electrolytic treatment to prepare a composite alumina membrane, which significantly improves the tribological properties of the aluminum alloy surface. In this process, in order to obtain a highly-ordered nanoporous alumina membrane with a thin enough barrier layer for further processing, after the first anodic oxidation in phosphoric acid (0.3 mol/L), the obtained alumina membrane is modified by anodizing it in a phosphoric acid-ammonium hexafluorosilicate bath, in combination with a step-by-step voltage drop without oxide removal. By this method, the resistance of the modified alumina membrane is also reduced greatly, which facilitates the deposition of copper nanowires in the sulfate bath. It is found that the composite alumina membrane filled with copper nanowires has a low friction coefficient of about 0.25 and effectively improves the friction condition, giving the surface a self-lubricating property.
机译：铝合金在工业应用中起着重要作用，但具有高摩擦系数和高磨损率。在铝合金表面进行阳极氧化处理的基础上，通过直流电（DC）电解处理将铜纳米线沉积到阳极氧化铝膜孔中，制备出复合氧化铝膜，从而显着提高了铝合金表面的摩擦学性能。在该方法中，为了获得具有足够薄的阻挡层以用于进一步处理的高度有序的纳米多孔氧化铝膜，在磷酸（0.3 mol / L）中进行第一次阳极氧化之后，通过对所得氧化铝膜进行阳极氧化处理对其进行改性。磷酸-六氟硅酸铵浴，并与不除去氧化物的逐步压降相结合。通过这种方法，改性氧化铝膜的电阻也大大降低，这有利于铜纳米线在硫酸盐浴中的沉积。发现填充有铜纳米线的复合氧化铝膜具有约0.25的低摩擦系数，并有效地改善了摩擦条件，赋予了表面自润滑性能。

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