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Characterization and study of antibacterial activity of spray pyrolysed ZnO:Al thin films

机译：喷雾热解ZnO：Al薄膜的表征与抗菌活性研究

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摘要

Aluminum-doped zinc oxide (ZnO:Al) thin films were deposited onto glass substrates using spray pyrolysis technique with the substrate temperature of 400?°C. X-ray diffraction analysis indicated that the films were polycrystalline with hexagonal wurtzite structure preferentially oriented along (002) direction. Surface morphology of the films obtained by scanning electron microscopy showed that the grains were of nanoscale size with porous nature for 6?at.% of Al. Atomic force microscopy observations revealed that the particles size and surface roughness of the films decreased with Al-doping. Optical measurements indicated that ZnO:Al (6?at.%) exhibited a band gap of 3.11?eV, which is lower than that of pure ZnO film, i.e. 3.42?eV. Photoluminescence analysis showed weak NBE emission at 396?nm for Al-doped films. The low resistivity, high hall mobility and carrier concentration values were obtained at a doping ratio of 6?at.% of Al. The effective incorporation of 6?at.% of Al into ZnO lattice by occupying Zn sites yielded a well-pronounced antibacterial activity against Staphylococcus aureus .
机译：使用喷涂热解技术将掺杂铝的氧化锌（ZnO：Al）薄膜沉积到玻璃基板上，基板温度为400°C。 X射线衍射分析表明该薄膜为具有六方纤锌矿结构的多晶晶体，优先沿（002）方向取向。通过扫描电子显微镜获得的膜的表面形态表明，晶粒为纳米级尺寸，具有6at。％的Al的多孔性质。原子力显微镜观察表明，掺杂Al后，薄膜的颗粒尺寸和表面粗糙度降低。光学测量表明，ZnO∶Al（6原子％）的带隙为3.11ΔeV，低于纯ZnO膜的带隙，即3.42ΔeV。光致发光分析表明，掺铝薄膜在396nm处的NBE发射很弱。在Al的掺杂率为6％（原子）时获得了低电阻率，高霍尔迁移率和载流子浓度值。通过占据锌位有效地将6at。％的Al掺入ZnO晶格中，对金黄色葡萄球菌具有明显的抑菌活性。

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