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首页> 外文期刊>International Journal of Electrochemical Science >Corrosion behavior of multilayer coatings deposited by PVD on Inconel 718 in Chloride and Sulphuric Acid solutions
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Corrosion behavior of multilayer coatings deposited by PVD on Inconel 718 in Chloride and Sulphuric Acid solutions

机译：PVD在Inconel 718上沉积的多层涂层在氯化物和硫酸溶液中的腐蚀行为

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摘要

The corrosion behavior of multilayer AlCrN/TiSi, AlCrN/TiCrSiN and AlCrN/AlCr + Cr coatingsdeposited by physical vapor deposition (PVD) technique was investigated Electrochemical techniquessuch as linear polarization resistance (RPL) and potentiodynamic polarization (PP) were used to studythe corrosion behavior performance of the multilayers PVD coatingsAfter electrochemical testing, thecoating surface morphology was analysed by scanning electron microscopy (SEM) and the atomiccomposition by energy dispersive X-ray spectroscopy (EDS). The results of the corrosion potentialindicated that there was no pattern of the behavior corrosive of the coatings in NaCl and H 2 SO 4 testsolutions. The corrosion rates of the different systems are in the range between 1E-3 mm/year and 1E-2mm/year in NaCl and H 2 SO 4 test solutions, respectively. Some coatings showed tendency to the pseudopassivation behavior in the different electrolytes with a positive hysteresis, which indicative of localizedcorrosion. For H 2 SO 4 the most stable coating was for AlCrN/TiSi. PVD coatings present the highestcorrosion rate in H 2 SO 4 , and both AlCrN/TiSi and AlCrN/AlCr + Cr present corrosion localized.AlCrN/AlCrN+CrN coating has lower pitting corrosion resistance.
机译：研究了通过物理气相沉积（PVD）技术沉积的多层AlCrN / TiSi，AlCrN / TiCrSiN和AlCrN / AlCr + Cr涂层的腐蚀行为使用线性极化电阻（RPL）和电势极化（PP）等电化学技术研究了腐蚀行为多层PVD涂层的性能电化学测试后，通过扫描电子显微镜（SEM）分析涂层表面形态，并通过能量色散X射线光谱（EDS）分析原子组成。腐蚀电位的结果表明在NaCl和H 2 SO 4测试溶液中没有腐蚀行为的图形。在NaCl和H 2 SO 4测试溶液中，不同系统的腐蚀速率分别在1E-3 mm /年和1E-2mm /年之间。一些涂层在具有正磁滞的不同电解质中表现出伪钝化行为的趋势，这表明局部腐蚀。对于H 2 SO 4，最稳定的涂层是AlCrN / TiSi。 PVD涂层在H 2 SO 4中的腐蚀速率最高，而AlCrN / TiSi和AlCrN / AlCr + Cr均表现出局部腐蚀。AlCrN/ AlCrN + CrN涂层的耐点蚀性较低。

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