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首页> 外文期刊>International Journal of Electrochemical Science >Effect of Curing Agents on the Photodegradation of Epoxy Coatings investigated by Electrochemical Impedance Spectroscopy
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Effect of Curing Agents on the Photodegradation of Epoxy Coatings investigated by Electrochemical Impedance Spectroscopy

机译：电化学阻抗谱研究固化剂对环氧涂层光降解的影响

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The photo-degradation behavior of LMPAR/DGEBA epoxy coatings under UV irradiation and theinfluence of the curing-agent molar ratio on water resistance were investigated using electrochemicalimpedance spectroscopy. After exposure to UV irradiation for 88 hours, a post-curing process as wellas the formation of carbonyl groups increased the low frequency impedance, in comparison to the asprepared sample. By increasing the irradiation time from 208 hours to 399 hours, the modulus valuesdecreased, probably due to the generation of some micro-defects near the sample surfaces. After 543 hof irradiation, the lower modulus values and the emergence of a second time constant implied that aninterfacial corrosion reaction occurred. Considering the anti-photodegradation of the epoxy coating,the optimal LMPAR/ DGEBA molar ratio was approximately 0.415, at which the water uptake and theporosity of the epoxy coating were relatively low, and the EIS spectra showed the characteristics of ahighly cross-linked structure in the coatings.
机译：利用电化学阻抗谱研究了LMPAR / DGEBA环氧涂料在紫外光下的光降解行为以及固化剂摩尔比对耐水性的影响。与所制备的样品相比，暴露于紫外线照射88小时后，后固化过程以及羰基的形成增加了低频阻抗。通过将辐照时间从208小时增加到399小时，模量值降低了，这可能是由于在样品表面附近产生了一些微缺陷所致。 543 hof辐照后，较低的模量值和第二时间常数的出现暗示发生了界面腐蚀反应。考虑到环氧涂料的抗光降解性，最佳LMPAR / DGEBA摩尔比约为0.415，此时环氧涂料的吸水率和孔隙率相对较低，EIS光谱显示出高交联结构的特征。涂料。

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