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首页> 外文期刊>ISIJ international >Residual Stress Analysis in PVD Coated Austempered Ductile Iron
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Residual Stress Analysis in PVD Coated Austempered Ductile Iron

机译：PVD涂层奥氏体球墨铸铁中的残余应力分析

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The aim of this work is to study residual stresses (RS) in PVD TiN and CrN coated ADI substrates with different nodule counts, austempering temperatures and surface finishing methods (grinding and polishing). Coatings were applied by arc ion plating using an industrial reactor and different sets of processing parameters. Residual stress measurements were performed by x-ray diffraction using the sin~(2)ψ method along two principal axes on the samples surface (parallel and perpendicular to the substrate abrasion direction). The film thickness, hardness and adhesion of each coated sample were also evaluated. The results obtained indicate that RS in TiN and CrN coated samples are compressive irrespective of the different substrates, surface finishing methods and processing parameters utilized. The parallel and perpendicular RS do not vary significantly, indicating a rotationally symmetric biaxial stress state. The RS of the coated samples are not influenced by the different substrate characteristics regarding microstructure, hardness and surface roughness. The microhardness and RS of TiN and CrN coated samples increase with film thickness. The increase in substrate temperature together with the decrease in the values of BIAS voltage, arc current and chamber pressure lead to microhardness and RS reduction. Grinding produces surface hardening and reduction of the compressive RS in the substrates, but causes no variations in the RS of the TiN and CrN coated samples. The adhesion strength quality of TiN and CrN coatings to ADI substrates can be related to indices ranging from HF1 to HF2.
机译：这项工作的目的是研究在PVD TiN和CrN涂层的ADI基板中的残余应力（RS），这些基板具有不同的结节数，回火温度和表面抛光方法（研磨和抛光）。使用工业反应器和不同组的加工参数通过电弧离子镀来施加涂层。残余应力的测量是使用sin-（2）ψ方法通过X射线衍射沿着样品表面上的两个主轴线（平行于和垂直于基材磨损方向）进行的。还评估了每个涂覆样品的膜厚度，硬度和粘附性。获得的结果表明，TiN和CrN涂层样品中的RS是压缩性的，而与所使用的不同基材，表面精加工方法和加工参数无关。平行和垂直RS没有明显变化，表明旋转对称的双轴应力状态。涂层样品的RS不受微观结构，硬度和表面粗糙度等不同基材特性的影响。 TiN和CrN涂层样品的显微硬度和RS随膜厚的增加而增加。基板温度的升高以及BIAS电压，电弧电流和腔室压力值的降低都会导致显微硬度和RS降低。研磨会产生表面硬化并降低基材中的压缩RS，但不会导致TiN和CrN涂层样品的RS发生变化。 TiN和CrN涂层对ADI基材的粘附强度质量可能与HF1到HF2范围内的指数有关。

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