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首页> 外文期刊>Entropy >Effects of Silicon Content on the Microstructures and Mechanical Properties of (AlCrTiZrV)-Si x -N High-Entropy Alloy Films
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Effects of Silicon Content on the Microstructures and Mechanical Properties of (AlCrTiZrV)-Si x -N High-Entropy Alloy Films

机译：硅含量对（AlCrTiZrV）-Si x -N高熵合金膜微结构和力学性能的影响

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A series of (AlCrTiZrV)-Si x -N films with different silicon contents were deposited on monocrystalline silicon substrates by direct-current (DC) magnetron sputtering. The films were characterized by the X-ray diffractometry (XRD), scanning electron microscopy (SEM), high-resolution transmission electron microscopy (HRTEM), and nano-indentation techniques. The effects of the silicon content on the microstructures and mechanical properties of the films were investigated. The experimental results show that the (AlCrTiZrV)N films grow in columnar grains and present a (200) preferential growth orientation. The addition of the silicon element leads to the disappearance of the (200) peak, and the grain refinement of the (AlCrTiZrV)-Si x -N films. Meanwhile, the reticular amorphous phase is formed, thus developing the nanocomposite structure with the nanocrystalline structures encapsulated by the amorphous phase. With the increase of the silicon content, the mechanical properties first increase and then decrease. The maximal hardness and modulus of the film reach 34.3 GPa and 301.5 GPa, respectively, with the silicon content (x) of 8% (volume percent). The strengthening effect of the (AlCrTiZrV)-Si x -N film can be mainly attributed to the formation of the nanocomposite structure.
机译：通过直流（DC）磁控溅射在单晶硅衬底上沉积一系列具有不同硅含量的（AlCrTiZrV）-Si x -N膜。通过X射线衍射（XRD），扫描电子显微镜（SEM），高分辨率透射电子显微镜（HRTEM）和纳米压痕技术对薄膜进行了表征。研究了硅含量对薄膜微观结构和力学性能的影响。实验结果表明，（AlCrTiZrV）N薄膜以柱状晶粒生长，并呈现（200）优先生长方向。硅元素的添加导致（200）峰的消失，以及（AlCrTiZrV）-Si x -N膜的晶粒细化。同时，形成网状非晶相，从而发展出具有被非晶相包封的纳米晶体结构的纳米复合结构。随着硅含量的增加，机械性能先增加然后降低。膜的最大硬度和模量分别达到34.3 GPa和301.5 GPa，硅含量（x）为8％（体积百分比）。 （AlCrTiZrV）-Si x -N膜的强化作用主要可归因于纳米复合结构的形成。

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