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首页> 外文期刊>Physical Review. Accelerators and Beams >Ion Motion Induced Emittance Growth of Matched Electron Beams in Plasma Wakefields
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Ion Motion Induced Emittance Growth of Matched Electron Beams in Plasma Wakefields

机译：离子运动诱导的等离子束场中匹配电子束的发射增长

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Plasma-based acceleration is being considered as the basis for building a future linear collider. Nonlinear plasma wakefields have ideal properties for accelerating and focusing electron beams. Preservation of the emittance of nano-Coulomb beams with nanometer scale matched spot sizes in these wakefields remains a critical issue due to ion motion caused by their large space charge forces. We use fully resolved quasistatic particle-in-cell simulations of electron beams in hydrogen and lithium plasmas, including when the accelerated beam has different emittances in the two transverse planes. The projected emittance initially grows and rapidly saturates with a maximum emittance growth of less than 80% in hydrogen and 20% in lithium. The use of overfocused beams is found to dramatically reduce the emittance growth. The underlying physics that leads to the lower than expected emittance growth is elucidated.
机译：基于等离子体的加速被认为是构建未来线性对撞机的基础。非线性等离子体唤醒场具有用于加速和聚焦电子束的理想特性。在这些尾流场中，保持纳米级匹配光斑尺寸的纳米库仑束的发射率仍然是一个关键问题，这是由于其较大的空间电荷力引起的离子运动。我们对氢和锂等离子体中的电子束使用完全解析的准静态单元内粒子模拟，包括当加速束在两个横向平面中具有不同发射率时。预计的发射率最初会增长并迅速饱和，氢的最大发射率增长小于80％，锂的最大发射率增长小于20％。发现使用过度聚焦的光束可以显着降低发射率的增长。阐明了导致低于预期的发射率增长的基本物理原理。

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