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首页> 外文期刊>Plasma and Fusion Research >Optical Emission Signatures of Dual Planar Magnetron Plasmas for TiO2 Deposition
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Optical Emission Signatures of Dual Planar Magnetron Plasmas for TiO2 Deposition

机译：TiO2沉积双平面磁控等离子体的光发射特征

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The dual planar magnetron (DPM) configuration features a mirror reactive magnetron sputtering system unlike that of a single planar unbalanced magnetron set-up. Optical emission signatures of a mixed species of oxygen and argon plasmas show a decrease in intensity peaks when only a single plane is biased. This manifests an oxide layer formation on the target for the single planar case thereby lowering the sputtering yield of the titanium target. No changes in emission intensity peaks are observed when the dual planes are biased. This is favorable for increasing the yield of sputtered titanium beneficial for raising the deposition rate of TiO2 thin film. The DPM process exhibits the anatase and rutile phases of the synthesized TiO2 films. The films are characterized by XRD, FE-SEM, reflectance and FTIR spectroscopy. Photo-reactive properties of the materials are also presented.
机译：双平面磁控管（DPM）配置具有镜面反应磁控溅射系统，与单平面不平衡磁控管装置不同。当仅偏压单个平面时，氧和氩等离子体的混合物种的光发射特征显示出强度峰的减小。对于单一平面壳体，这表明在靶上形成氧化层，从而降低了钛靶的溅射产率。当双平面偏置时，没有观察到发射强度峰值的变化。这有利于提高溅射钛的得率，有利于提高TiO 2 薄膜的沉积速率。 DPM工艺显示了合成的TiO 2 薄膜的锐钛矿相和金红石相。所述膜通过XRD，FE-SEM，反射率和FTIR光谱表征。还介绍了材料的光反应性。

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