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首页> 外文期刊>Plasma and Fusion Research >Chemical Binding States of Carbon Atoms Migrated in Tungsten Coating Layer Exposed to JT-60U Divertor Plasmas
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Chemical Binding States of Carbon Atoms Migrated in Tungsten Coating Layer Exposed to JT-60U Divertor Plasmas

机译：暴露于JT-60U转向等离子体的钨涂层中迁移的碳原子的化学键合态

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Carbon migration in the tungsten coating layer exposed to JT-60U divertor plasmas has been investigated by analysis of chemical binding states of the carbon atoms. More than 1% of carbon atoms were accumulated as graphitic carbon, amorphous carbon and/or carbon-deuterium bonds. This concentration was more than five orders of magnitude higher than the solubility of carbon atoms in tungsten lattice. Up to 20% of ditungsten carbide (W2C) was also formed in the tungsten coating layer. These findings suggested the following carbon migration mechanism in the tungsten coating layer. The incident carbon migrates along grain boundaries and defects such as pores over the depth which is evaluated by the carbon diffusion coefficient in tungsten lattice. The carbon atoms trapped on grain surface penetrate and diffuse in the grains. The carbon atoms exceeded the solubility of carbon atoms in tungsten lattice chemically bind to tungsten atoms and form W2C.
机译：通过分析碳原子的化学结合态，研究了暴露于JT-60U偏滤器等离子体的钨涂层中的碳迁移。超过1％的碳原子以石墨碳，无定形碳和/或碳-氘键形式积累。该浓度比碳原子在钨晶格中的溶解度高五个数量级以上。在钨涂层中还形成了高达20％的碳化钨（W 2 C）。这些发现表明在钨涂层中的以下碳迁移机理。入射碳在整个深度上沿着晶界和缺陷（例如孔）迁移，该深度由钨晶格中的碳扩散系数评估。捕获在晶粒表面的碳原子渗透并扩散到晶粒中。碳原子超过了碳原子在钨晶格中的溶解度，化学结合到钨原子上并形成W 2 C。

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