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Wakefield Generation in a Plasma Filled Rectangular Waveguide

机译:等离子体填充矩形波导中的Wakefield产生

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We study the wakefield in a plasma filled rectangular waveguide based on a differential equation derived interms of the wake potential ?, when the pulse duration τ matches with inverse of the plasma frequency fp-1. Thisequation is solved using fourth-order Runge-Kutta method for the Gaussian-like profile of the microwave pulse. The effectsof microwave frequency f , waveguide width b and microwave intensity I are investigated on the wakefield EW .The amplitude of the wakefield is found to increase with microwave pulse duration and its intensity, but it gets decreasedwith microwave frequency and waveguide width. By optimizing various parameters, we can achieve wakefield of appreciablestrength for the purpose of particle acceleration.
机译:当脉冲持续时间τ与等离子频率fp-1的倒数相匹配时,我们基于微分方程推导了唤醒电势α的项,研究了等离子填充矩形波导中的尾波场。对于微波脉冲的高斯样轮廓,使用四阶Runge-Kutta方法求解该方程。研究了微波频率f,波导宽度b和微波强度I对尾波场EW的影响。发现尾波场的幅度随微波脉冲持续时间及其强度的增加而增大,但随微波频率和波导管宽度的减小而减小。通过优化各种参数,我们可以达到一定强度的尾流场,以达到加速粒子的目的。

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