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首页> 外文期刊>Procedia CIRP >The Application of Diamond-based Electrodes for Efficient EDMing of Silicon Wafers for Freeform MEMS Device Fabrication
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The Application of Diamond-based Electrodes for Efficient EDMing of Silicon Wafers for Freeform MEMS Device Fabrication

机译：金刚石基电极在自由曲面MEMS器件制造中硅晶片的高效电火花加工中的应用

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摘要

Using EDM technology in conjunction with traditional MEMS fabrication techniques offers great advantages in the creation of freeform features silicon wafers. The ability to mass produce features, however, is often limited by high electrode wear rates due to poor EDMing stability based on silicon's material properties. By investigating the use of novel diamond-based electrode materials, high productivity and low wear rates can be achieved simultaneously. First, the feasibility of applying diamond-based electrodes is presented through the rough EDMing of 200 hemispherical features. Second a two-step EDM roughing and finishing process is applied in order to achieve high quality and axisymmetric hemispherical features. Using only an EDM roughing process, 200 hemispherical features were successfully fabricated in 80minutes with virtually zero electrode end wear. The two-step EDM roughing and finishing process resulted in the fabrication of 15 highly axisymmetric hemispherical features with only 15 microns of total electrode end wear. A case study is presented in the fabrication of hemispherical shell structures, where the EDMed hemispherical features are used as a mold for MEMS device fabrication.
机译：将EDM技术与传统MEMS制造技术结合使用可在创建自由形状特征的硅晶片方面提供巨大优势。但是，由于基于硅材料特性的电火花加工稳定性差，因此高批量电极的磨损率通常会限制批量生产特征的能力。通过研究新型金刚石基电极材料的使用，可以同时实现高生产率和低磨损率。首先，通过对200个半球形特征进行粗加工，提出了应用基于金刚石的电极的可行性。其次，采用两步EDM粗加工和精加工工艺以实现高质量和轴对称的半球形特征。仅使用EDM粗加工，就可以在80分钟内成功制作出200个半球形特征，电极端部磨损几乎为零。经过两步的EDM粗加工和精加工过程，制造出15个高度轴对称的半球形特征，而电极的总端部磨损仅为15微米。在半球形壳结构的制造中提供了一个案例研究，其中将EDMed半球形特征用作MEMS器件制造的模具。

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