...
  • 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Procedia CIRP >The Development of a Pulsed Power Supply for μECM
【24h】

The Development of a Pulsed Power Supply for μECM

机译：μECM脉冲电源的开发

获取原文
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Electrochemical Machining (ECM) is a well-established process in areas such as the aviation and automobile industries but the further commercial development and use of the μECM process has been prohibited by several issues, the main one being the lack of a suitable power supply unit (PSU) that can deliver the high-current pulses required while maintaining a minimal form factor, physical geometry, and realistic cost. The work presented in the paper is based on research that was carried out during the development of a novel switch mode power supply (SMPS) that is capable of delivering nano-second pulses at the MHz frequency range to the machine tool with minimal inductance. Preliminary experimental work was conducted to obtain initial design parameters and specifications required for the power supply. This included analysis of load characterisation followed by an investigation into the power switching using gallium nitrate based field effect transistors (FETs) as a novel switching technology and an investigation of the effects of the Inter Electrode Gap (IEG) loop. A Pulse Width Modulator (PWM) Frequency generator was constructed that was tested and shown to produce a modulated frequency of up to 45 MHz with a minimum pulse on time of 14 ns. Methods were investigated and deployed for monitoring the current and voltage sensing feedback for optimising process performance and control. Control system requirements were defined and implemented by adapting a Texas Instrument Piccolo microcontroller specifically for interfacing with the PSU that was then integrated with the higher-level Delta Tau control system deployed for the controlling the overall machining process of the μECM demonstrator machine. The PSU was tested, validated and integrated with the demonstrator machine for a number of machining trials that were conducted on copper and 18CrNi8, with material removal observed. This paper will outline the development work that was undertaken for the PSU and present findings from the PSU control tests. In addition, findings will also be discussed and presented from the analysis of a novel multi-probe IEG connection concept which was shown to be correctly transmitting pulses to the IEG with a total loop inductance of just 50 nH with pulse-on times as short as 50 ns without any issue.
机译：电化学加工（ECM）在航空和汽车工业等领域是一种成熟的工艺，但是μECM工艺的进一步商业开发和使用已受到若干问题的禁止，主要问题是缺少合适的电源装置（PSU）可以提供所需的高电流脉冲，同时保持最小的外形尺寸，物理几何形状和实际成本。本文提出的工作基于在新型开关电源（SMPS）的开发过程中进行的研究，该开关电源能够以最小的电感将MHz频率范围内的纳秒脉冲传送到机床。进行了初步的实验工作，以获得电源所需的初始设计参数和规格。这包括分析负载特性，然后研究使用基于氮化镓的场效应晶体管（FET）作为一种新型开关技术的功率开关，以及研究电极间间隙（IEG）回路的影响。构造了经过测试的脉冲宽度调制器（PWM）频率发生器，显示出可产生高达45 MHz的调制频率，且最小脉冲开启时间为14 ns。研究并部署了用于监视电流和电压感测反馈的方法，以优化过程性能和控制。通过改编专门用于与PSU接口的Texas Instruments Piccolo微控制器来定义和实现控制系统要求，然后将其与更高级别的Delta Tau控制系统集成在一起，以控​​制μECM演示机的整个加工过程。对PSU进行了测试，验证，并与演示机集成在一起，进行了许多在铜和18CrNi8上进行的机加工试验，观察到材料去除的情况。本文将概述为PSU进行的开发工作，并介绍PSU控制测试的发现。此外，还将通过对新型多探针IEG连接概念的分析来讨论和提出发现，该方法被证明可以将脉冲正确地传输到IEG，总环路电感仅为50 nH，脉冲接通时间短至50 ns，没有任何问题。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号