HF-Release of Sacrificial Layers in CMOS-integrated MOEMS structures

S D?ring; M Friedrichs; W Pufe; M Schulze

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HF-Release of Sacrificial Layers in CMOS-integrated MOEMS structures

机译：CMOS集成MOEMS结构中牺牲层的HF释放

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InthispaperwewillpresentdetailsofthereleaseprocessofSiO2sacrificiallayersweusewithinamulti-levelMOEMSprocessdevelopedbyIPMS.Usingsuchsacrificiallayersgainalotofbenefitsnecessaryfortheproductionofhigh-endMOEMSdeviceslikehighsurfacequalityandgreatsurfaceplanarity.HowevertheHF-releaseofthesacrificiallayercanbeconnectedwithspecificissues.Wepresent,whichmechanismsareinvolvedinthereleaseprocessandhowknowingthem,canbethekeyforanoptimizedperformanceofthedevice.More-overwewillpresenthowtoprotecttheCMOSbackplaneofourdevicesfromunwantedHFattackduringtherelease...

机译：InthispaperwewillpresentdetailsofthereleaseprocessofSiO2sacrificiallayersweusewithinamulti-levelMOEMSprocessdevelopedbyIPMS.Usingsuchsacrificiallayersgainalotofbenefitsnecessaryfortheproductionofhigh-endMOEMSdeviceslikehighsurfacequalityandgreatsurfaceplanarity.HowevertheHF-releaseofthesacrificiallayercanbeconnectedwithspecificissues.Wepresent，whichmechanismsareinvolvedinthereleaseprocessandhowknowingthem，canbethekeyforanoptimizedperformanceofthedevice.More-overwewillpresenthowtoprotecttheCMOSbackplaneofourdevicesfromunwantedHFattackduringtherelease ...

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《Journal of Physics: Conference Series》 |2016年第1期|共页
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S D?ring; M Friedrichs; W Pufe; M Schulze;
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2. Releasing large-area SU-8 structures without using any sacrificial layers [J] . Mao Zebing, Yoshida Kazuhiro, Kim Joon-wan Microelectronic Engineering . 2019,第May期

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3. One-step fabrication of hierarchically structured silicon surfaces and modification of their morphologies using sacrificial layers [J] . Cho S.J., Seok S.Y., Kim J.Y., Journal of nanomaterials . 2013,第Pta4期

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HF-Release of Sacrificial Layers in CMOS-integrated MOEMS structures

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