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Synthesis and characterization of boron-doped ordered mesoporous carbon by evaporation induced self-assembly under HCl conditions
By using hydrochloric acid (HCl) as an acidity regulator, boron-doped ordered mesoporous carbon (B-OMCs) were synthesized via solvent evaporation induced self-assembly (EISA) method. And the self-assembly mechanism of the B-OMCs under HCl conditions was investigated. Not only low-molecular weight boron-modified phenolic resin (BPF), but also triblock copolymer F127 can be protonated by HCl, which results in enhancement of the interaction between precursor and template. Both double-layer hydrogen bonding and electrostatic Coulomb forces act as the driving force for self-assembly of B-OMCs under HCl conditions. In addition, the effect of HCl content on the mesostructure and character of the B-OMCs was studied. With the increase of HCl content, the pore size of B-OMCs decreases, while the surface area, pore order and boron content of B-OMCs increase initially, and then drop off gradually. When pH = 4, the obtained B-OMC has a well-ordered mesoporous structure, highest surface area (690 m2 g?1) and boron content (1.96 wt%). Besides, it possesses excellent electrochemical and capacitance performance (200 F g?1).
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机译：以盐酸（HCl）为酸度调节剂，通过溶剂蒸发诱导自组装（EISA）法合成了硼掺杂有序介孔碳（B-OMCs）。并研究了HCl条件下B-OMC的自组装机理。不仅低分子量的硼改性酚醛树脂（BPF），而且三嵌段共聚物F127都可以被HCl质子化，从而增强了前体与模板之间的相互作用。双层氢键和静电库仑力均是在HCl条件下B-OMC自组装的驱动力。此外，研究了HCl含量对B-OMC介观结构和特征的影响。随着HCl含量的增加，B-OMCs的孔径减小，而B-OMCs的表面积，孔序和硼含量先增加，然后逐渐下降。当pH = 4时，所得B-OMC具有良好的介孔结构，最大表面积（690 m 2 g ？1 ）和硼含量（1.96 wt％）。此外，它还具有出色的电化学和电容性能（200 F g ？1 ）。
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