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Extended π-conjugative n-p type homostructural graphitic carbon nitride for photodegradation and charge-storage applications

机译:用于光降解和电荷存储应用的扩展π共轭n-p型同构石墨氮化碳

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An n-p type homostructural metal-free graphitic carbon nitride (g-Csub3/subNsub4/sub) semiconductor is designed and developed for pollutant abatement and energy storage application. The successful grafting of vibrio-like morphology-based g-Csub3/subNsub4/sub by 2, 5-Thiophenedicarboxylic acid (TDA) molecule and the development of amide-type linkage substantiated the prosperous uniting of g-Csub3/subNsub4/sub with organic TDA moiety is demonstrated. An extended π-conjugative TDA grafted g-Csub3/subNsub4/sub exhibited band gap tunability with broadband optical absorbance in the visible region. Mott-Schottky analysis exhibited the formation of n-p type homostructural property. As a result, obtained TDA grafted g-Csub3/subNsub4/sub has extended π-conjugation, high surface area and adequate separation of charge carriers. The change in the photocatalytic performance of grafted g-Csub3/subNsub4/sub is inspected for degradation of acid violet 7 (AV 7) dye under visible light irradiation. The charge storage capacity of grafted g-Csub3/subNsub4/sub was additionally assessed for supercapacitive behaviour. The charge capacitive studies of grafted g-Csub3/subNsub4/sub exhibited the areal capacitance of 163.17 mF cmsup-2/sup and robust cyclic stability of 1000 cycles with capacity retention of 83%.
机译:设计并开发了一种n-p型均质无金属石墨碳氮化物(g-C 3 N 4 )半导体,用于污染物减排和能量存储应用。 2,5-噻吩二甲酸(TDA)分子成功接枝了基于弧菌样形态的gC 3 N 4 ,酰胺型连接的发展证实了繁荣证明了gC 3 N 4 与有机TDA部分的结合。扩展的π共轭TDA接枝的g-C 3 N 4 在可见光区具有带隙吸收和宽带吸光度。 Mott-Schottky分析显示出n-p型同构性质的形成。结果,获得的TDA接枝的g-C 3 N 4 具有扩展的π共轭,高表面积和足够的电荷载体分离。在可见光照射下,检查了接枝的g-C 3 N 4 的光催化性能的变化,以了解酸性紫7(AV 7)染料的降解情况。还评估了接枝的g-C 3 N 4 的电荷存储容量的超电容行为。接枝gC 3 N 4 的电荷电容研究显示其面积电容为163.17 mF cm -2 ,具有1000个循环的稳定循环稳定性保留率达83%。

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