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首页> 外文期刊>Journal of Photopolymer Science and Technology >Improvement of Patterning Homogeneity in a Field of Projection Exposure System Using a Gradient-Index Lens Array
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Improvement of Patterning Homogeneity in a Field of Projection Exposure System Using a Gradient-Index Lens Array

机译：使用梯度索引镜头阵列改进投影曝光系统领域的图案均匀性

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Pattern width homogeneity in an exposure field of gradient-index (GRIN) lens array was greatly improved by changing the sub-scan method for averaging the pattern widths. By investigating the pattern width distribution in the exposure field, it was clarified that the parts, where the printed patterns were degraded and pattern widths were notably changed, appeared as striped lines. It was supposed that the striped abnormal pattern-width change was caused by the extra exposures for the times when the sub-scan stage was stopped at both the sub-scan ends for turning the scan direction. For this reason, sub-scan length was vastly extended, and the sub-scan stage was turned at the both ends after all the patterns on a reticle passed over the actually used parts of a GRIN lens array. By this method, no patterns were exposed and projected on a wafer while the sub-scan stage was stopped for turning at the both ends. As a result, 15-μm L&S patterns were almost homogeneously printed in the exposure field within a variation range of ±6%.
机译：通过改变用于平均图案宽度的子扫描方法，大大提高了梯度索引（GRIN）镜头阵列的曝光场中的图案宽度均匀性。通过研究曝光场中的图案宽度分布，阐明了所印刷图案劣化的部件，并且显着地改变了图案宽度，出现为条纹线。假设条纹异常图案宽度变化是由额外的曝光引起的，当在用于转动扫描方向的子扫描端时停止子扫描阶段时的额外曝光。因此，副扫描长度大大延伸，并且在掩模版上的所有图案通过咧嘴镜头阵列的实际使用的部分之后，在两端转动副扫描阶段。通过这种方法，在晶片上没有暴露并突出图案，而副扫描阶段停止以转动两端。结果，在±6％的变化范围内几乎在曝光场中几乎均匀地印刷了15μm的L＆S图案。

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