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首页> 外文期刊>International Journal of Electrochemical Science >Chemical Bath Synthesis and physico-chemical Characterizations of NiO-CoO Composite Thin Films for Supercapacitor applications
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Chemical Bath Synthesis and physico-chemical Characterizations of NiO-CoO Composite Thin Films for Supercapacitor applications

机译：用于超级电容器应用的Nio-CoO复合薄膜的化学浴合成和物理化学特性

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摘要

The most commonly used materials in high-power devices such as electrochemical capacitors andsuper-capacitors studies include the transition metal oxides. We use simple and economicallyviable Chemical Bath Deposition (CBD) methods for the growth of nanocrystalline nickel-cobaltoxides (NiO-CoO) thin films. The NiO-CoO thin films, which were obtained using nickel sulfateand cobalt sulfate as the starting materials, were deposited on non-conducting glass substrates andsteel substrates. The XRD results show that the average crystallite size of the thin films is about2.2nm. The thin films which were also characterized for AFM and SEM revealed randomlyoriented nano-flake structures with absorbance greater than 45% in the UV region of theelectromagnetic spectrum and band gap energy range between 2.75 eV and 2.95 eV. The electrical8 10 resistivity of the material was of the order of 10 10 m with activation energy of about-5 6.5488x10 eV. Characteristic peaks were observed in the cyclic voltammetric studies. Thehydrophilicity and supercapacitive characteristics of the NiO-CoO composite thin films show thatthey could possibly be useful in supercapacitive applications.
机译：电化学电容器和疏血电容器研究中的高功率器件中最常用的材料包括过渡金属氧化物。我们利用简单且经济上的化学浴沉积（CBD）方法用于纳米晶镍 - 钴鎓（NiO-CoO）薄膜的生长。使用镍磺酸钴硫酸钴作为原料获得的NiO-CoO薄膜沉积在非导电玻璃基板上。 XRD结果表明，薄膜的平均微晶尺寸约为2.2nm。该薄膜的特征在于AFM和SEM，揭示了电磁光谱UV区域的吸光度大于45％的随机纳米片结构，带隙能量范围在2.75eV和2.95eV之间。电气8 10的电阻率为1010μm，激活能量为约-5 6.5488×10eV。在循环伏安研究中观察到特征峰。 NiO-CoO复合薄膜的水细胞性和超级电容特性表明，在超级电容应用中可能可用。

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