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首页> 外文期刊>International Journal of Photoenergy >Photoelectrocatalytic Degradation of Humic Acids Using Codoped TiO2Film Electrodes under Visible Light
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Photoelectrocatalytic Degradation of Humic Acids Using Codoped TiO2Film Electrodes under Visible Light

机译：可见光下的双重TiO2Film电极的光电催化剂降解腐殖酸

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摘要

Cu/N codoped TiO2films on Ti substrates were successfully prepared by electrochemical method with the goal of enhancing the photoelectrocatalytic activity under visible light. The morphology and composition of the Cu/N codoped films were characterized using field emission scanning electron microscopy (FESEM), X-ray diffraction (XRD), energy dispersive X-ray (EDX), and UV-Vis diffusion reflection spectroscopy (UV-Vis DRS). The photocatalytic activities of the Cu/N codoped TiO2films were evaluated by the degradation of humic acid. The visible light photocatalytic degradation of humic acid (HA) was tested and Cu/N codoped TiO2films showed the highest degradation efficiency up to 41.5% after 210 minutes of treatment. It showed that Cu2+andNH4+codoped TiO2film significantly improved the photocatalytic efficiency under the visible light. When +5.0 V anodic bias potential and visible light were simultaneously applied, the degradation efficiency of HA over the Cu/N codoped TiO2films significantly improved to 93.5% after 210 minutes of treatment.
机译：通过电化学方法成功地制备了Ti衬底上的Cu / N编码TiO2Films，其目的是在可见光下提高光电催化活性。使用现场发射扫描电子显微镜（FeSEM），X射线衍射（XRD），能量分散X射线（EDX）和UV-VI扩散反射光谱（UV-）的形态和组成的表征表征Cu / N类膜的形态和组成。 Vis Drs）。通过腐殖酸的降解来评估Cu / N类别TiO2Films的光催化活性。测试腐殖酸（HA）的可见光光催化降解，Cu / N类别TiO2Films在210分钟后显示出高达41.5％的最高降解效率。它表明，Cu2 +和NH4 +编码的TiO2Film显着提高了可见光下的光催化效率。当同时施加+5.0V阳极偏置电位和可见光时，在210分钟后，Cu / N编码的TiO2Films的HA的降解效率明显改善至93.5％。

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