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首页> 外文期刊>RSC Advances >Atomic layer deposition with rotary reactor for uniform hetero-junction photocatalyst, g-C3N4@TiO2 core–shell structures
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Atomic layer deposition with rotary reactor for uniform hetero-junction photocatalyst, g-C3N4@TiO2 core–shell structures

机译：用旋转反应器沉积原子层沉积，用于均匀杂连接光催化剂，G-C3N4 @ TiO2芯壳结构

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摘要

A heterojunction of TiO _(2) grown on g-C _(3) N _(4) particles is demonstrated using atomic layer deposition (ALD), equipped with a specifically designed rotary reactor for maintaining stable mechanical dispersion of g-C _(3) N _(4) particles during ALD. The photocatalytic activity of the g-C _(3) N _(4) @ALD-TiO _(2) core–shell composites was examined using the degradation of rhodamine B dye under visible light irradiation. The optimal composite with 5 ALD cycles of TiO _(2) exhibited the highest photocatalytic reaction rate constant among the composites with a range of ALD cycles from 2 to 200 cycles, which was observed to be 3 times higher than that of pristine g-C _(3) N _(4) and 2 times higher than that of g-C _(3) N _(4) @TiO _(2) composite prepared using a simple impregnation method. The ALD-TiO _(2) were well-dispersed on the g-C _(3) N _(4) surface, while TiO _(2) nanoparticles were agglomerated onto the g-C _(3) N _(4) in the g-C _(3) N _(4) @TiO _(2) composite prepared by the impregnation method. This created uniform and stable heterojunctions between the g-C _(3) N _(4) and TiO _(2) , thus, enhancing the photocatalytic activity.
机译：使用原子层沉积（ALD）对GC _（3）N _（4）颗粒生长的TiO _（2）的异质结，具体实施的旋转反应器，用于保持GC _（3）n的稳定机械分散体_（4）颗粒在ALD期间。使用罗丹明B染料下可见光照射下的罗丹明B染料的降解检查G-C _（3）N _（4）〜α（4）〜α（3）〜α（4）的光催化活性。具有5ALD循环的TiO _（2）的最佳复合材料在复合材料中表现出最高的光催化反应速率常数，该复合材料中的一系列ALD循环从2〜200次循环，观察到比原始GC _的3倍（ 3）N _（4）和高于GC _（3）n _（4）@tio_（2）的2倍，使用简单的浸渍方法制备的复合材料。 Ald-TiO _（2）在GC _（3）N _（4）表面上均匀分散，而TiO _（2）纳米颗粒在GC中的GC _（3）N _（4）上凝集到GC _（3）n _（4）上_（3）n _（4）@tio _（2）通过浸渍方法制备的复合材料。这在G-C _（3）N _（4）和TiO _（2）之间产生均匀且稳定的杂疾病，因此增强了光催化活性。

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