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首页> 外文期刊>RSC Advances >Nanomorphology-dependent pseudocapacitive properties of NiO electrodes engineered through a controlled potentiodynamic electrodeposition process
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Nanomorphology-dependent pseudocapacitive properties of NiO electrodes engineered through a controlled potentiodynamic electrodeposition process

机译：通过受控电位电沉积工艺改造的Nio电极的纳米晶体依赖性假性特性

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摘要

Three nickel oxide (NiO) electrodes of different morphologies have been successfully engineered through a controlled potentiodynamic electrodeposition process in the presence of different nickel precursors. The effect of nickel precursors on the structural, morphological and pseudocapacitive properties of NiO thin film electrodes have been systematically investigated. The structural information obtained from the X-ray diffraction patterns confirm the formation of cubic structured NiO. The field-emission scanning electron microscopic images endorses for the evolution of uniformly distributed up-grown nanoflakes, irregular nanoflake-like and well-covered porous architecture comprised of interconnected uniform nanoflakes of NiO nanostructures with surface contact angle values 126°, 148° and 104°. The effect of the developed NiO nanostructures on pseudocapacitance behavior has been thoroughly investigated using cyclic voltammetry, chronopotentiometric charge–discharge and electrochemical impedance spectroscopy measurement techniques. The optimal specific capacitance of 893 F g ~(?1) has been achieved for NiO electrode with interconnected nanoflake-type morphology at the scan rate of 5 mV s ~(?1) . Furthermore, these NiO electrodes have demonstrated long-term cycling stability in KOH electrolyte. The electrochemical impedance spectroscopy measurements carried out on developed NiO nanostructured electrodes corroborate that, NiO electrode composed of uniformly distributed interconnected nanoflakes is the best and most suitable electrode for good capacity electrochemical supercapacitors.
机译：在不同镍前体存在下，已经通过受控电位动力学电沉积工艺成功地改造了不同形态的三种氧化镍（NIO）电极。镍前体对NiO薄膜电极结构，形态学和假壳特性的影响已得到系统地研究。从X射线衍射图获得的结构信息确认了立方结构的NIO的形成。用于均匀分布的上生长纳米薄片，不规则的纳米辊状和覆盖的多孔结构的现场排放扫描电子显微镜图像，其包括与表面接触角值126°，148°和104的相互连接的均匀纳米薄片组成的NiO纳米结构。 °。使用循环伏安法，步数型电荷放电和电化学阻抗光谱测量技术彻底研究了发育的NIO纳米结构对假偶联行为的影响。对于NiO电极已经实现了893f g〜（α1）的最佳特定电容，其在扫描速率为5mV S〜（α1）的互联纳米蛋白形态。此外，这些NiO电极在KOH电解质中表现出长期循环稳定性。在开发的NIO纳米结构电极进行的电化学阻抗光谱测量测量是由均匀分布的互联纳米薄片组成的NiO电极是良好的电容电化学超级电容器的最佳和最合适的电极。

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