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Gap separation-controlled nanogap electrodes by molecular ruler electroless gold plating

机译:间隙分离控制的纳米隙电极通过分子尺无电镀镀金

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A simultaneous fabrication process of multiple nanogap electrodes at desired gap separations by the technique of molecular ruler electroless gold plating (MoREP) is reported. Initial gold nanogap electrodes with a gap separation of 22 nm were immersed into MoREP solutions consisting of chloroauric acid, surfactant molecules of alkyltrimethylammonium bromide (C _( n ) TAB, n = 12–18) and ascorbic acid as a reducing agent. The electroless plating locally self-terminates between the gap when the surfactant molecules physisorbed to the surface of one electrode interdigitate with the ones of the opposite electrode. The mean nanogap separation correlated with the alkyl chain length, and can be controlled between 2.5 ± 0.6 and 3.3 ± 0.8 nm by choosing the alkyl chain length of the surfactant molecules (C _(12) –C _(18) ). A double-gate single-electron transistor (SET) was chemically assembled by introducing chemically a synthesized gold nanoparticle into the MoREP nanogap electrodes, and showed stable Coulomb diamonds under application of both gate voltages.
机译:据报道,通过分子尺冷镀金镀金(MORTEP)技术在所需间隙分离时同时制造多纳米隙电极的制造过程。将带间隙分离为22nm的初始金纳米盖电极浸入由氯真酸,烷基三甲基溴化铵(C _(n)突片,N = 12-18)和抗坏血酸作为还原剂中组成的MOTED溶液。当表面活性剂分子与一个电极的表面与相对电极的表面相互作用时,化学镀在间隙之间局部自终止。通过选择表面活性剂分子的烷基链长度(C_(12)-C _(18)),平均纳米盖分离分离与烷基链长度相关,并且可以通过选择表面活性剂分子的烷基链长度来控制2.5±0.6和3.3±0.8nm。通过将合成的金纳米颗粒引入MOTED纳米粒子电极,在施加两个栅极电压下,通过将合成的金纳米颗粒引入到MOTED纳米粒子电极中进行化学组装双栅极单电子晶体管(设定)。

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