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首页> 外文期刊>Coatings >Electrochemical Behavior and Electrodeposition of Sn Coating from Choline Chloride–Urea Deep Eutectic Solvents
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Electrochemical Behavior and Electrodeposition of Sn Coating from Choline Chloride–Urea Deep Eutectic Solvents

机译:胆碱氯化丙氨酸脲深凝胶深度溶剂的IN涂层电化学行为及电沉积

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摘要

The electrochemical behavior and electrodeposition of Sn were investigated in choline chloride (ChCl)–urea deep eutectic solvents (DESs) containing SnCl2 by cyclic voltammetry (CV) and chronoamperometry techniques. The electrodeposition of Sn(II) was a quasi-reversible, single-step two-electron-transfer process. The average transfer coefficient and diffusion coefficient of 0.2 M Sn(II) in ChCl–urea at 323 K were 0.29 and 1.35 × 10?9 cm2?s?1. The nucleation overpotential decreased with the increase in temperature and SnCl2 concentration. The results of the chronoamperometry indicated that the Sn deposition on tungsten electrode occurred by three-dimensional instantaneous nucleation and diffusion controlled growth using the Scharifker–Hills model. Scanning electron microscopy (SEM) showed that the morphology of the deposits is uniform, as a dense and compact film prepared by potentiostatic electrolysis on Cu substrate. X-ray diffraction (XRD) analysis revealed that the deposits were pure metallic Sn.
机译:通过循环伏安法(CV)和计时荧光技术,在胆碱(CHCL) - 尿嘧啶(CHCL) - 脲的深层共晶溶剂(DESS)中研究了SN的电化学行为和电沉积。 Sn(II)的电沉积是准可逆的单步双电子转移过程。在323k的CHCl-urea中的平均转移系数和扩散系数为0.2M sn(II)为0.29和1.35×10?9cm 2·s≤1。随着温度和SnCl2浓度的增加,核心过电位降低。计时法的结果表明,使用Scharifker-Hills模型的三维瞬时成核和扩散控制的三维瞬时成核和扩散控制的Sn沉积发生。扫描电子显微镜(SEM)显示沉积物的形态是均匀的,作为通过在Cu基质上的电位电解制备的致密和紧凑的薄膜。 X射线衍射(XRD)分析显示沉积物是纯金属Sn。

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