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Anticorrosion Properties of the Low-Temperature Glow Plasma Nitriding Layer on AISI 904L Austenitic Stainless Steel in Hydrofluoric Acid Obtained at Various NH3 Pressures

机译:在各种NH3压力下获得的AISI 904L奥氏体不锈钢上的低温辐射等离子体氮化层的防腐性能

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A low-temperature (400 °C) glow plasma nitriding layer on AISI 904L austenitic stainless steel was obtained at various NH3 pressures and studied using electrochemical method, X-ray diffraction, and scanning Kelvin probe. The pressure of NH3 dominated the microstructure of the nitriding layer. The saturation degree of γN controlled corrosion performance and microhardness. Insufficient NH3 pressure (100 Pa) facilitated the transformation of the nitriding layer to harmful nitrides (CrN) due to a localized overheating effect caused by the over-sputtering current.
机译:在各种NH 3压力下获得低温(400°C)滤液等离子体氮化层,并在各种NH 3压力下获得,并使用电化学方法,X射线衍射和扫描开尔文探针研究。 NH3的压力主导了氮化层的微观结构。 γN控制腐蚀性能和微硬度的饱和度。由于过溅射电流引起的局部过热效应,NH 3压力(100Pa)不足(100Pa)促进氮化层的转化为有害的氮化物(CRN)。

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