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首页> 外文期刊>Micro and Nano Systems Letters >Study on thickness-dependence characteristics of bismuth ferrite (BFO) for ultraviolet (UV) photodetector application
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Study on thickness-dependence characteristics of bismuth ferrite (BFO) for ultraviolet (UV) photodetector application

机译:紫外线(UV)光电探测器施用铋铁氧体(BFO)厚度依赖性特征的研究

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The present research work reports on the fabrication of ultraviolet (UV) photodetectors using bismuth ferrite (BiFeO_(3,)BFO) thin films with varying thickness. Using the spray pyrolysis technique, BFO thin films were deposited on the glass substrate at 673?K. The deposited BFO thin films were characterized by Raman and FTIR spectroscopic analysis. The morphological analysis reveals uniform grain distribution for the prepared BFO samples. The optical analysis reveals that transmittance value decreases upon an increase in the thickness of BFO thin films and the calculated optical band gap value lies between 2.0 to 2.3?eV. The varying thickness of the BFO active layer was stacked between ITO and Al electrodes and the current–voltage (I–V) characteristics of the fabricated ITO/BFO/Al devices were studied under dark and UV illumination (λ?=?365?nm). It was observed that BFO with an optimum thickness (365?nm) exhibits higher photoresponsivity of 110?mA/W with an external quantum efficiency (EQE) of 37.30%. The impact of different thickness of the BFO active layer, the role of adsorption and desorption of oxygen (O_(2)) molecules upon the surface of BFO layers towards UV photoresponse characteristics were investigated.
机译:本研究工作报告了使用具有不同厚度的铋铁氧体(BIFEO_(3,)BFO)薄膜的紫外(UV)光电探测器的制备。使用喷雾热解技术,将BFO薄膜沉积在673Ω·k上的玻璃基板上。沉积的BFO薄膜的特征在于拉曼和FTIR光谱分析。形态学分析揭示了制备的BFO样品的均匀晶粒分布。所述光学分析显示,透射率值在增加BFO薄膜的厚度和所计算的光学带隙值位于2.3?电子伏特2.0之间减小。在黑暗和UV照明下,研究了BFO有源层的不同厚度,并且在ITO和Al电极之间堆叠了制造的ITO / BFO / Al器件的电流 - 电压(I-V)特性(λ= 365?NM )。观察到具有最佳厚度(365Ω)的BFO表现出较高的110°MA / W具有37.30%的外部量子效率(EQE)的光响应性。研究了BFO活性层的不同厚度,对BFO层表面朝向UV光响应特性的氧气层(O_(2))分子的不同厚度的影响。

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