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首页> 外文期刊>Electrocatalysis >Electrochemical Growth of Surface Oxides on Nickel. Part 1: Formation of α-Ni(OH)2 in Relation to the Polarization Potential, Polarization Time, and Temperature
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Electrochemical Growth of Surface Oxides on Nickel. Part 1: Formation of α-Ni(OH)2 in Relation to the Polarization Potential, Polarization Time, and Temperature

机译:镍上表面氧化物的电化学生长。第1部分:α-Ni(OH)2 的形成与极化电位,极化时间和温度的关系

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Electro-oxidation of Ni(poly) in 0.5 M aqueous KOH solution at various polarization potentials (E p) up to 0.5 V vs. reversible hydrogen electrode, for polarization times (t p) up to 2 h, and at 285 ≤ T ≤ 318 K leads to the formation of a thin layer of α-Ni(OH)2. Interfacial capacitance measurements show that the Ni(poly) electrode covered with a layer of α-Ni(OH)2 can be completely reduced back to its metallic state by applying a negative-going potential scan with a lower potential limit of −0.2 V. An increase of E p, t p, and/or T results in an increase of the thickness of the α-Ni(OH)2 layer, which, however, never exceeds two monolayers. The electrochemical formation of α-Ni(OH)2 follows a direct logarithmic growth kinetic law. The results reported in this contribution and their interpretation imply that other oxide growth theories, such as the Langmuir-type adsorption, the point defect model, the electron tunneling, or the nucleation-and-growth model, are not applicable to the growth of α-Ni(OH)2. The potentiostatic growth of α-Ni(OH)2 on Ni(poly) is successfully treated by applying the interfacial place-exchange mechanism and the associated kinetic law.
机译:Ni(poly)在0.5 M KOH水溶液中,相对于可逆氢电极,在高达0.5 V的不同极化电势(E p )下的电氧化,极化时间(tp )长达2 h ,并且在285≤T≤318 K时会形成α-Ni(OH)2薄层。界面电容测量表明,覆盖一层α-Ni(OH)2 的Ni(poly)电极可以通过施加负电位极限较低的负向扫描来完全还原回其金属态-0.2V。Ep ,tp 和/或T的增加导致α-Ni(OH)2 层的厚度增加,但是,永远不会超过两个单层。 α-Ni(OH)2 的电化学形成遵循直接对数生长动力学定律。在该贡献及其解释中报告的结果表明,其他氧化物生长理论,例如Langmuir型吸附,点缺陷模型,电子隧穿或成核生长模型均不适用于α的生长。 -Ni(OH)2 。应用界面位置交换机理和相关的动力学规律,成功地处理了α-Ni(OH)2 在Ni(poly)上的恒电位生长。

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