Research Results from S.U. Jang and Colleagues Update Understanding of Microelectronic Engineering

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Research Results from S.U. Jang and Colleagues Update Understanding of Microelectronic Engineering

机译：S.U.的研究结果张先生和同事们对微电子工程学有了新的认识

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2011 MAY 18 - (VerticalNews.com) -- According to a study from Pohang, SouthrnKorea, "It was studied that FePt-Ta thin films prepared on MgO (1 0 0) buffer-layer by DC/RFrnmagnetron co-sputtering have shown better magnetic properties and micro structuralrnimprovement."

机译：2011年5月18日-（VerticalNews.com）-根据韩国南韩浦项市的一项研究，“研究表明，通过DC / RFrn磁控管共溅射在MgO（1 0 0）缓冲层上制备的FePt-Ta薄膜已显示更好的磁性能和微观结构的改善。”

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《Energy Business Journal》 |2011年第31期|119-119|共1页
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City:Pohang; Country:South Korea; Region:Asia; Electronics; Engineering; Magnetron; Microelectronic Engineering; Microelectronics;

机译：城市：浦项国家：韩国;地区：亚洲;电子产品;工程;磁控管;微电子工程;微电子学;

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Research Results from S.U. Jang and Colleagues Update Understanding of Microelectronic Engineering

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