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首页> 外文期刊>Environmental Science & Technology >Photoelectrochemical DNA sensor for the rapid detection of DNA damage induced by styrene oxide and the Fenton reaction
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Photoelectrochemical DNA sensor for the rapid detection of DNA damage induced by styrene oxide and the Fenton reaction

机译：光电电化学DNA传感器，用于快速检测由氧化苯乙烯和Fenton反应引起的DNA损伤

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摘要

Rapid and sensitive detection methods are in urgent demand for the screening of an overwhelming number of existing and new chemicals as potential DNA-damaging agents. In this study, two photoelectrochemistry-based DNA sensor configurations were employed in the detection of DNA damage caused by styrene oxide and Fe2+/H2O2. The organic compound and heavy metal represent genotoxic chemicals possessing two major damaging mechanisms, DNA adduct formation and DNA oxidation. In the first sensor configuration, a ruthenium tris(bipyridine)-labeled avidin film and a double-stranded calf thymus DNA (ds-DNA) film were assembled successively on tin oxide nanoparticle film electrodes. Photogenerated Ru(III) oxidized guanidine and adenosine bases in DNA and gave rise to photocurrent. DNA damage was detected after the reaction of the DNA film with either styrene oxide or Fe2+/H2O2, which exposed more DNA bases for photooxidation and resulted in increased photocurrent. In the second configuration, an unlabeled avidin film and a ds-DNA film were assembled on the semiconductor electrode. A DNA intercalator, Ru(bpy)(2)(dppz)(2+) (bpy = 2,2'-bipyridine, dppz = dipyrido[3,2-a:2',3'-c]phenazine), was employed as the photoelectrochemical signal reporter. After the chemical reaction with the damaging agents, the DNA film bound less Ru(bpy)(2)(dppz)(2+), accompanied by a drop in photocurrent. Both sensors were used to follow the reaction course in styrene oxide and Fenton reagents and produced similar results. According to the data, damage of the DNA film was complete in 1 h in Fenton reagents and in 3 h in styrene oxide. In addition, the Fenton reaction induced much more severe damage than styrene oxide. The results demonstrate for the first time that the photoelectrochemical DNA sensor can detect both DNA adduct formation and DNA oxidation. It has the potential of becoming a screening tool for the rapid assessment of the genotoxicity of existing and new chemicals.
机译：迫切需要快速和灵敏的检测方法来筛选绝大多数作为潜在DNA破坏剂的现有和新化学品。在这项研究中，基于光电化学的两种DNA传感器配置用于检测由氧化苯乙烯和Fe2 + / H2O2引起的DNA损伤。有机化合物和重金属代表具有两种主要破坏机制的遗传毒性化学物质：DNA加合物形成和DNA氧化。在第一种传感器配置中，三氧化二钌（联吡啶）标记的抗生物素蛋白膜和双链小牛胸腺DNA（ds-DNA）膜依次组装在氧化锡纳米颗粒膜电极上。光生Ru（III）氧化DNA中的胍和腺苷碱基，并产生光电流。 DNA膜与氧化苯乙烯或Fe2 + / H2O2反应后检测到DNA损伤，后者暴露出更多的DNA碱基用于光氧化，并导致光电流增加。在第二配置中，未标记的抗生物素蛋白膜和ds-DNA膜组装在半导体电极上。 DNA嵌入剂Ru（bpy）（2）（dppz）（2+）（bpy = 2,2'-联吡啶，dppz =双吡啶[3,2-a：2'，3'-c]吩嗪）被用作光电化学信号的报告者。与破坏剂发生化学反应后，DNA膜结合的Ru（bpy）（2）（dppz）（2+）减少，光电流下降。两种传感器均用于跟踪在氧化苯乙烯和Fenton试剂中的反应过程，并产生相似的结果。根据数据，在Fenton试剂中1小时和在氧化苯乙烯中3小时即可完成对DNA膜的破坏。另外，芬顿反应引起的损害比氧化苯乙烯严重得多。结果首次证明，光电化学DNA传感器可以检测DNA加合物的形成和DNA氧化。它有可能成为快速评估现有和新化学品遗传毒性的筛选工具。

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