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Secondary Organic Aerosol Formation from the Photooxidation of p- and o-Xylene

机译:对二甲苯和邻二甲苯的光氧化形成次生有机气溶胶

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The formation of secondary organic aerosol (SOA) from the photooxidation of xylene isomers (m-, p-, and o-xylenes) has been extensively investigated. The dependence of SOA aerosol formation on the structure of xylene isomers in the presence of NO was confirmed. Generally, SOA formation of p-xylene was less than that of m- and o-xylenes. This discrepancy varies significantly with initial NO_x levels. In a NO_x-free environment, the difference of aerosol formation between o- and p-xylenes becomes insignificant. Several chemical pathways for the SOA dependence on structure and NO_x are explored, with the experimental findings indicating that organic peroxides may be a major key to explaining SOA formation from aromatic hydrocarbons.
机译:已经广泛研究了由二甲苯异构体(间二甲苯,对二甲苯和邻二甲苯)的光氧化形成次要有机气溶胶(SOA)。在NO存在下,确认了SOA气溶胶形成对二甲苯异构体结构的依赖性。通常,对二甲苯的SOA形成量少于间二甲苯和邻二甲苯的SOA形成量。该差异随初始NO_x水平的不同而有很大差异。在无NO_x的环境中,邻二甲苯和对二甲苯之间气溶胶形成的差异变得微不足道。探索了SOA依赖于结构和NO_x的几种化学途径,实验结果表明有机过氧化物可能是解释由芳烃形成SOA的主要关键。

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