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Helium retention of vanadium alloy after energetic helium ion irradiation

机译:高能氦离子辐照后钒合金的氦保留

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Helium irradiation experiments of V-4Ti alloy were conducted in an ECR ion irradiation apparatus by using helium ions with energy of 5 keV. The ion fluence was in the range from 1 x 10~(17) He/cm~2 to 8 x 10~(17) He/cm~2. After the helium ion irradiation, the helium retention was examined by using a technique of thermal desorption spectroscopy (TDS). After the irradiation, the blisters with a size of about 0.1 μm were observed at the surface, and the blister density increased with the ion fluence. Two desorption peaks were observed at approximately 500 and 1200K in the thermal desorption spectrum. When the ion fluence was low, the retained helium desorbed mainly at the higher temperature regime. As increase of the ion fluence, the desorption at the lower temperature peak increased and the retained amount of helium saturated. The saturated amount was approximately 2.5 x 10~(17) He/cm~2. This value was comparable with those of the other plasma facing materials such as graphite.
机译:使用能量为5 keV的氦离子,在ECR离子辐照设备中进行V-4Ti合金的氦辐照实验。离子通量在1×10〜(17)He / cm〜2至8×10〜(17)He / cm〜2的范围内。氦离子辐照后,通过使用热脱附光谱法(TDS)技术检查氦气的保留。照射后,在表面观察到大小约为0.1μm的水泡,并且水泡密度随着离子通量而增加。在热解吸谱中大约在500和1200K处观察到两个解吸峰。当离子通量低时,保留的氦主要在较高温度下解吸。随着离子通量的增加,在较低温度峰处的解吸增加,并且保留的氦量饱和。饱和量约为2.5×10-(17)He / cm 2。该值可与其他面向等离子体的材料(例如石墨)相媲美。

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