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Concentration Profiles in Screened Wells under Static and Pumped Conditions

机译：静态和泵送条件下筛选井中的浓度分布

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摘要

Purge and pump samples from screened wells reflect concentration averaging and contaminant redistribution by wellbore flow. These issues were assessed in a screened well at the Hanford Site by investigating the vertical profile of a technetium-99 plume in a conventional well under static and pumped conditions. Specific conductance and technetium-99 concentrations were well correlated, and this enabled measurement of specific conductance to be used as a surrogate for technetium-99 concentration. Time-series measurements were collected during purging from three specific conductance probes installed in the well at 1.2, 3.1, and 4.9 m below the static water level in a 7.7-m-deep screened well. The vertical contaminant profile adjacent to the well in the aquifer was calculated using the concentration profile in the well during pumping, the pumping flow rate, and a wellbore flow and mixing model. The plume was found to be stratified in the aquifer-the highest concentrations occurred adjacent to the upper part of the screened interval. The purge and pump sample concentrations were 41% to 58% of the calculated peak concentration in the aquifer. Plume stratification in the aquifer adjacent to the well screen became more pronounced as pumping continued. Extended pumping may have partially reversed the effect of contaminant redistribution in the aquifer by wellbore flow and allowed the stratification of the plume to be more observable. It was also found that the vertical profile of contamination in the well under static (i.e., nonpumping conditions) was not representative of the profile in the aquifer. Thus, passive or micropurge sampling techniques, which sample the wellbore water at different depths, would not yield results representative of the aquifer in this well.
机译：筛选过的井中的吹扫和泵送样品反映了平均浓度和井眼流量对污染物的重新分配。通过研究常规井在静态和泵送条件下a 99羽流的垂直剖面，在汉福德站点的一口筛选井中评估了这些问题。比电导与tech 99浓度之间具有很好的相关性，因此可以将比电导的测量值用作tech 99浓度的替代物。在清洗过程中，从安装在井中的三个特定电导探针（分别位于静态水位以下1.2、3.1和4.9 m处）的深层7.7 m筛分井中收集了时间序列测量值。使用泵送过程中井中的浓度分布，泵送流速以及井筒流动和混合模型，计算出含水层中与井相邻的垂直污染物分布。发现羽流在含水层中分层-最高浓度出现在筛选间隔的上部附近。吹扫和泵送样品的浓度为含水层中计算出的峰值浓度的41％至58％。随着抽水的继续，邻近井网的含水层中的羽流分层变得更加明显。延长的抽水可能已部分抵消了井眼流动造成的含水层中污染物再分配的影响，并使羽流的分层更加明显。还发现在静态（即非抽水条件）下井中污染物的垂直剖面不能代表含水层中的剖面。因此，在不同深度对井眼水进行采样的被动或微吹扫采样技术不会产生代表该井中含水层的结果。

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  • 来源
    《Ground Water Monitoring & Remediation》 |2009年第2期|78-86|共9页
  • 作者

    John P. McDonald; Ronald M. Smith;

  • 作者单位

    CH2M Hill Plateau Remediation Company, Soil and Groundwater Remediation Project, P.O. Box 1600, MSIN R3-50, Richland, WA 99352;

    Pacific Northwest National Laboratory, Environmental Sustainability Division, P.O. Box 999, MSIN K6-96, Richland, WA 99352;

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