Coplanar waveguides were fabricated in standard complimentary metal-oxide semiconductor (CMOS) with postprocessing micromachining. ICs were designed with commercial CAD tools, fabricated through the MOSIS service, and subsequently suspended by maskless top-side etching. Absence of the lossy silicon substrate after etching results in significantly improved insertion loss characteristics, dispersion characteristics, and phase velocity. Measurements were performed at frequencies from 1 to 40 GHz, before and after micromachining. These show improvement in loss characteristics of orders of magnitude. For the micromachined line, loss does not exceed 4 dB/cm. Before etching, loss as high as 38 dB/cm is measured. Phase velocity /spl Gamma//sub p//spl ap/0.8/spl middot/c is achieved for the micromachined line.
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机译：共面波导是在标准的互补金属氧化物半导体（CMOS）中进行后处理微加工而制成的。使用商用CAD工具设计IC，然后通过MOSIS服务进行制造，然后通过无掩模的顶部蚀刻将其悬挂。蚀刻之后不存在有损耗的硅衬底，导致插入损耗特性，色散特性和相速度得到显着改善。在微加工之前和之后，以1至40 GHz的频率进行测量。这些表明损耗特性提高了几个数量级。对于微加工线，损耗不超过4 dB / cm。在蚀刻之前，测得的损耗高达38 dB / cm。对于微加工线，实现相速度/ spl Gamma // sub p // spl ap / 0.8 / spl middot / c。
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