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首页> 外文期刊>IEEE Transactions on Magnetics >Ion beam deposition of carbon overcoats for magnetic thin film media
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Ion beam deposition of carbon overcoats for magnetic thin film media

机译：用于磁性薄膜介质的碳涂层的离子束沉积

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Ion beam deposited carbon has been investigated for its use as an overcoat for magnetic thin film media. By using a gridless end-Hall ion source, carbon has been deposited that possesses hardnesses to 18 GPa, stress to 4.5 GPa, and densities up to 2.6 g/cc. Contact-start-stop testing of ion beam deposited carbon to fifty thousand cycles shows a marked improvement in failure rate compared to hydrogenated and nitrogenated carbon. Energetic deposition of carbon thin films can lead to implantation of energetic species into the magnetic layer. Simulations have been performed to assess the vulnerability of the magnetic layer to energetic implantation of carbon. In addition, the effect of the partial pressure on the magnetic performance is assessed and a critical impurity concentration defined.
机译：离子束沉积碳已被研究用作磁性薄膜介质的外涂层。通过使用无栅端霍尔离子源，已沉积的碳具有18 GPa的硬度，4.5 GPa的应力和高达2.6 g / cc的密度。与氢化碳和氮化碳相比，离子束沉积碳至五万次循环的接触启停测试显示出故障率显着提高。碳薄膜的高能沉积会导致高能物质注入到磁性层中。已经进行了模拟以评估磁性层对高能碳注入的脆弱性。此外，评估了分压对磁性能的影响，并确定了临界杂质浓度。

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