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首页> 外文期刊>Magnetics, IEEE Transactions on >Magnetic Field Annealing Effects on Magnetic Properties of Electrodeposited Co/Cu Multilayered Nanowires
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Magnetic Field Annealing Effects on Magnetic Properties of Electrodeposited Co/Cu Multilayered Nanowires

机译：磁场退火对电沉积Co / Cu多层纳米线磁性能的影响

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摘要

Co/Cu nanowires were fabricated by electrodeposition using anodic alumina templates, with 100 nm diameter nanopores. The thickness of Co and Cu layer was about 45 and 5 nm, respectively. The magnetic properties of multilayered nanowires have been studied before and after simple and magnetic field (MF) annealing. For simple annealing, an increase in coercivity and squareness (SQ) along easy axis of magnetization has been observed. Magnetic field annealing has been done under MF of (boldsymbol 1) T. For comparison, the MF annealing effect on magnetic properties has been studied using fast and slow temperature variations. The corresponding change in saturation magnetization, coercivity, remanent SQ, and the shape of hysteresis loops has been investigated. The coercivity Hc decreases in case of MF annealing with fast temperature variation, whereas it increases in case of MF annealing with slow temperature variation, as compared with as deposited. The enhanced magnetic anisotropy has been observed by slow MF annealing (SMFA), whereas magnetic anisotropy attenuated a little by fast MF annealing. Annealing without MF has also shown the enhanced magnetic anisotropy. SMFA and annealing without MF is likely to improve the interface of Co/Cu.
机译：通过使用具有100 nm直径纳米孔的阳极氧化铝模板进行电沉积来制造Co / Cu纳米线。 Co和Cu层的厚度分别为约45nm和5nm。在简单和磁场（MF）退火之前和之后，已经研究了多层纳米线的磁性。对于简单退火，已经观察到沿着易磁化轴的矫顽力和矩形度（SQ）的增加。在 （粗体符号1） T的MF下进行磁场退火。为进行比较，MF退火对已经使用快速和缓慢的温度变化研究了磁性。已经研究了饱和磁化强度，矫顽力，剩余SQ和磁滞回线形状的相应变化。与沉积相比，在具有快速温度变化的MF退火的情况下，矫顽力Hc降低，而在具有缓慢温度变化的MF退火的情况下，矫顽力Hc升高。缓慢的MF退火（SMFA）已观察到增强的磁各向异性，而快速MF退火则磁各向异性有所减弱。没有MF的退火也显示出增强的磁各向异性。 SMFA和不使用MF的退火可能会改善Co / Cu的界面。

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