High coercivity in Co-Cr films induced by nitrogen gas addition during room temperature sputter-deposition

Hoada N.; Chiba T.

首页> 外文期刊>IEEE Transactions on Magnetics >High coercivity in Co-Cr films induced by nitrogen gas addition during room temperature sputter-deposition

【24h】

High coercivity in Co-Cr films induced by nitrogen gas addition during room temperature sputter-deposition

机译：室温溅射沉积过程中添加氮气导致Co-Cr薄膜的高矫顽力

获取原文

获取原文并翻译 | 示例

掌桥外文数据库（机构版） >>

开具论文收录证明 >>

文献代查 >>

页面导航

摘要
著录项
相似文献
相关主题

摘要

Nitrogen gas addition was investigated for deposition of Co-Cr films at room temperature. It was found that nitrogen addition has a remarkable effect on increasing perpendicular coercivity Hc/sub /spl perp// for films deposited at high Ar pressures although negligible amount of nitrogen was observed in the films. The increase in He, was interpreted in terms of a microstructure change which is characterized by development of an isolated structure accompanied by grain size reduction. Films deposited at low Ar pressures exhibited only little increase in He, with the nitrogen gas addition. Also, nitrogen inclusion and a lattice expansion were observed for these films.

机译：研究了在室温下添加氮气以沉积Co-Cr膜的方法。已经发现，对于在高Ar压力下沉积的膜，氮的添加对提高垂直矫顽力Hc / sub / splperp //具有显着的影响，尽管在膜中观察到的氮量可忽略不计。 He的增加是根据微观结构的变化来解释的，该变化的特征是伴随着晶粒尺寸减小的孤立结构的发展。在低Ar压力下沉积的膜，在添加氮气的情况下，He的He增长很小。同样，对于这些膜观察到了氮夹杂和晶格膨胀。

著录项

来源
《IEEE Transactions on Magnetics》 |1995年第6期|P.2758-2760|共3页
作者
Hoada N.; Chiba T.;
展开▼
作者单位

展开▼
收录信息
原文格式 PDF
正文语种 eng
中图分类磁性材料、铁氧体;
关键词

相似文献

外文文献
中文文献
专利

1. High coercivity in Co-Cr films for perpendicular recording prepared by low temperature sputter-deposition [J] . Honda N., Ariake J. IEEE Transactions on Magnetics . 1994,第6期

机译：通过低温溅射沉积制备的用于垂直记录的Co-Cr膜的高矫顽力
2. Effects of hydrogen in working gas for sputter-deposition on surface morphology and microstructure of indium tin oxide thin films grown at room temperature [J] . Suning Luo, Shigemi Kohiki, Koichi Okada, Materials Letters . 2009,第27期

机译：溅射沉积工作气体中的氢对室温生长的铟锡氧化物薄膜表面形态和微观结构的影响
3. Spectroscopic investigations of the microstructure changes induced by substrate temperature in nitrogen-substituted amorphous carbon thin films [J] . M. Benlahsen, M. Therasse Carbon: An International Journal Sponsored by the American Carbon Society . 2004,第11期

机译：氮取代无定形碳薄膜中由衬底温度引起的微观结构变化的光谱研究
4. Field emission enhancement of amorphous carbon nitride films by the addition of argon to the reactive gas of nitrogen [C] . Junjie Li, Mimura, H., . 2005

机译：通过将氩气添加到氮的反应气体中来增强非晶氮化碳膜的场发射
5. Nitrogen trace gas emissions and soil nitrogen dynamics following nitrogen additions in tropical montane rain forests. [D] . Hall, Sharon Jae. 1998

机译：在热带山地雨林中添加氮后，氮的痕量气体排放量和土壤氮动态。
6. Nitrogen Addition Exacerbates the Negative Effects of Low Temperature Stress on Carbon and Nitrogen Metabolism in Moss [O] . Bin-Yang Liu, Chun-Yi Lei, Wei-Qiu Liu -1

机译：氮的添加加剧了低温胁迫对藓类植物碳和氮代谢的负面影响
7. Effects of hydrogen in working gas for sputter-deposition on surface morphology and microstructure of indium tin oxide thin films grown at room temperature [O] . Luo Suning, Kohiki Shigemi, Okada Koichi, 2009

机译：溅射沉积工作气体中的氢对室温生长的铟锡氧化物薄膜表面形态和微观结构的影响
8. GETTERING OF RESIDUAL GASES AND THE ADSORPTION RATE OF HYDROGEN ON EVAPORATED MOLYBDENUM FILMS AT LIQUID NITROGEN TEMPERATURES [R] . Angus L. Hunt, Charles C. Damm, Earl C. Popp 1961

机译：在液氮温度下对蒸发的钼膜中残留气体的吸附和氢的吸附速率

High coercivity in Co-Cr films induced by nitrogen gas addition during room temperature sputter-deposition

摘要

著录项

相似文献

相关主题

期刊订阅