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Effect of magnetic annealing on plated permalloy and domain configurations in thin-film inductive head

机译:电磁退火对薄膜感应头镀坡莫合金和畴结构的影响

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摘要

The magnetic annealing behavior of electroplated, 2.00- mu m-thick, NiFe films containing nominally 82% Ni, in the temperature range from 100 to 500 degrees C, was investigated through characterization of the structural properties of full films and the domain configurations of films shaped like an inductive-head yoke. A transition in the magnetic properties of the films was observed in the temperature regime of 350-450 degrees C. Concomitant changes in film stress from 0.2 to 1.4 GPa and in magnetostriction from -2.2 to -3.5*10/sup -6/ were measured across the transition. Transmission electron micrographs and X-ray diffraction analysis showed that recrystallization with
机译:通过表征全膜的结构特性和膜的畴构型,研究了厚度为2.00μm的NiFe电镀膜(名义上含82%Ni)在100至500℃的温度下的磁退火行为。形状像感应头轭。在350-450摄氏度的温度范围内观察到了薄膜的磁性变化。测量了薄膜应力从0.2到1.4 GPa的同时磁致伸缩从-2.2到-3.5 * 10 / sup -6 /的变化。在整个过渡过程中。透射电子显微镜和X射线衍射分析表明,

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