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首页> 外文期刊>IEEE Transactions on Magnetics >High coercivity of CoCrTa on a very thin Cr underlayer
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High coercivity of CoCrTa on a very thin Cr underlayer

机译：在非常薄的Cr底层上CoCrTa的高矫顽力

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摘要

RF sputtered CoCrTa films (Co-15 wt.% Cr-4.7 wt.% Ta) deposited on various thicknesses of Cr underlayer (200 AA to 800 AA) for longitudinal magnetic recording were investigated. A coercivity of 1500 Oe can be easily obtained on a 200-AA Cr underlayer with low argon pressure (4 mtorr) and high substrate bias (-100 V). Emphasis has been placed on the influence of (1010) texture formation on the in-plane coercivity. Microstructure observation revealed by TEM shows that the grain size and grain structure were changed with the thickness of the Cr underlayer. Several mechanisms are proposed to explain the experimentally observed phenomena of argon pressure and substrate bias effects on the coercivity change of this CoCrTa/Cr film.
机译：研究了用于纵向磁记录的各种厚度的Cr底层（200 AA至800 AA）上沉积的RF溅射CoCrTa膜（Co-15 wt。％Cr-4.7 wt。％Ta）。在低氩气压力（4 mtorr）和高衬底偏压（-100 V）的200-AA Cr底层上可以轻松获得1500 Oe的矫顽力。重点放在（1010）纹理形成对面内矫顽力的影响上。 TEM显示的显微组织观察表明，晶粒尺寸和晶粒结构随Cr底层的厚度而变化。提出了几种机制来解释实验观察到的氩气压力和衬底偏斜现象对该CoCrTa / Cr薄膜矫顽力变化的影响。

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